Substrate Holder Gas Curtain for Rapid Cooling
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Solution Overview
Problem
Conventional vertical substrate processing apparatuses take a long time to cool substrates due to the heat from the heat insulating part, which prolongs the cooling process, especially for substrates at the lower stages of the substrate holder.
Innovation Solution
A substrate processing apparatus with a gas supply system that forms a gas curtain between the lowermost substrate and the heat insulating part, using multiple gas outlets to interrupt the ascending air current and prevent heat transfer, along with controlled gas flow rates to enhance cooling efficiency and prevent particle generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a heat insulating part is used in the substrate holder, then thermal insulation is improved, but substrate cooling time increases
Solution Approach 1:
The substrate holder is divided into multiple stages with substrates arranged at different heights. The heat insulating part is segmented to provide insulation only where needed (at the bottom), while upper regions remain exposed for efficient cooling. This segmentation allows simultaneous thermal insulation during processing and rapid cooling after processing.
Solution Approach 2:
A gas curtain is introduced as an intermediary medium between the heat insulating part and the substrates during cooling. The gas flow creates a barrier that prevents direct heat transfer from the heat insulating part to the substrates, enabling rapid cooling while maintaining the structural integrity and insulation function of the heat insulating part.
2Loss of time
If gas flow rate is increased to improve cooling efficiency, then substrate cooling time decreases, but particle roll-up increases
Solution Approach 1:
The gas supply system provides different gas flow rates to different regions. A first gas supply part provides higher flow rates for rapid cooling, while a second gas supply part provides lower flow rates in regions prone to particle roll-up. This local differentiation of gas flow quality achieves both rapid cooling and particle prevention simultaneously.
Solution Approach 2:
The gas curtain acts as an intermediary that mediates between the conflicting requirements of rapid cooling and particle prevention. By carefully controlling the gas flow characteristics, the curtain provides cooling effect while its stable structure prevents particle generation and roll-up.
3Loss of time
If multiple gas supply parts are added to improve cooling efficiency, then substrate cooling time decreases, but device complexity increases
Solution Approach 1:
The gas supply system is designed with multi-functionality. The same gas supply parts serve multiple purposes: providing gas curtains for thermal isolation, enabling rapid cooling, and preventing particle roll-up. This universal design achieves complex cooling control without proportionally increasing device complexity.
Solution Approach 2:
The gas supply system is designed to be self-regulating. The gas flows automatically create the desired curtains and cooling patterns without requiring complex external control mechanisms. The system uses the natural properties of gas flow to achieve the desired effects, reducing the need for additional control devices.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration significantly shortens the cooling time of substrates by blocking heat from the heat insulating part and improving yield by preventing particle roll-up and enhancing cooling efficiency through optimized gas flow management.
Implementation Method 1
a gas supply part having gas outlets at a height position between one of the plurality of substrates held at a lowermost stage of the substrate holding part and the heat insulating part and configured to supply a gas toward the substrate holder
Data Source
AI summary
There is provided a technique includes: a substrate holder including a heat insulating part and a substrate holding part disposed above the heat insulating part and holding substrates in multiple stages; a process chamber processing the substrates held by the substrate holding part; a transfer chamber adjacent to the process chamber and transferring the substrates to the substrate holding part; a transfer mechanism transferring the substrate holder; a first gas supply part installed on one side of the transfer chamber and supplying gas into the transfer chamber; a second gas supply part having gas outlets at a height position between the substrate held at a lowermost stage of the substrate holding part and the heat insulating part and supplying a gas toward the substrate holder; and a controller controlling the transfer mechanism, the first gas supply part and the second gas supply part.