Substrate Holder and Guard Structure to Prevent Solution Splashing
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Solution Overview
Problem
Existing substrate processing devices face issues with processing solution splashing back onto non-processed surfaces due to connecting parts and annular spaces, leading to defects, and struggle with cleaning the inner peripheral surfaces of guards, increasing manufacturing costs and particle generation.
Innovation Solution
A substrate processing device design featuring a holding member and an opposed member with protrusions and restricting structures to prevent solution splashing, along with a rotating mechanism and a common cleaning liquid discharge system for both the guard and holding member, ensuring efficient processing and cleaning without solution scattering.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a shielding plate and holding member are used to process substrates, then substrate processing is enabled, but processing solution splashes back onto non-processed surfaces causing defects
Solution Approach 1:
The patent extracts and removes the harmful connecting parts and annular spaces that cause solution splashing. By eliminating these problematic structural elements, the invention prevents processing solution from splashing back onto non-processed surfaces, thereby resolving the contradiction between enabling substrate processing and preventing harmful solution splashing.
Solution Approach 2:
The patent converts the harmful splashing action into a beneficial controlled flow. By designing specific flow paths and containment structures, the processing solution that would otherwise splash harmfully is redirected to follow controlled paths, preventing defects while maintaining the necessary processing function.
2Object-affected harmful factors
If guards are added to prevent solution splashing, then substrate protection is improved, but cleaning difficulty and manufacturing cost increase
Solution Approach 1:
The patent merges the cleaning functions for both the guard and holding member into a single integrated cleaning system. By combining these cleaning operations, the invention reduces device complexity and manufacturing costs while maintaining effective protection against solution splashing, thus resolving the contradiction between protection and cleaning simplicity.
Solution Approach 2:
The patent creates a universal cleaning mechanism that serves multiple functions - cleaning both the guard and holding member with a single system. This multi-functional approach eliminates the need for separate cleaning systems, reducing overall device complexity while maintaining comprehensive protection and cleaning capabilities.
3Ease of manufacture
If connecting parts are used to assemble the device, then device assembly is enabled, but processing solution accumulates in annular spaces causing particle generation
Solution Approach 1:
The patent extracts and eliminates the annular spaces created by conventional connecting parts. By removing these spaces where processing solution could accumulate, the invention prevents particle generation while maintaining ease of manufacture through alternative connection methods that do not create trapping zones.
Solution Approach 2:
Instead of using conventional connecting parts that create annular spaces, the patent inverts the approach by designing connection structures that eliminate these spaces. The inverted design philosophy ensures that connecting elements do not create regions where processing solution can accumulate and generate particles.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents processing solution from splashing back onto non-processed surfaces, reduces particle generation, and simplifies the cleaning process, thereby enhancing substrate processing efficiency and reducing manufacturing costs.
Implementation Method 1
a substrate processing device design featuring a holding member and an opposed member with protrusions and restricting structures to prevent solution splashing, along with a rotating mechanism and a common cleaning liquid discharge system
Data Source
AI summary
A substrate processing device includes a holding member for holding a substrate, and an opposed member having a body portion and an extended portion extending from at least a part of a peripheral edge part of the body portion. A protrusion is provided on one part of a tip side part of the extended portion and a side surface part of the holding member, and the other part is provided with a restricting structure disposed opposite to the protrusion and restricting relative motion of the protrusion. The relative motion between the holding member and the opposed member is restricted, and the substrate processing device further includes a rotating mechanism, and a nozzle for discharging a processing solution and the protrusion and the restricting structure are disposed below an upper surface of the holding member.