Substrate Holder Nozzle Sensing for Interferer Distance Detection

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Solution Overview

Problem

Existing substrate transfer apparatuses face challenges in accurately determining the distance between a substrate holder and potential interferers due to variations in capacitance measurements based on the material properties of the interferers, leading to potential substrate damage and particle generation from unintended contact.

Innovation Solution

A substrate transfer apparatus equipped with a nozzle flow path and a common gas suction mechanism, featuring a pressure sensor and flow rate sensor to measure gas pressure and flow rate, allowing for precise determination of the distance between the substrate holder and interferers by analyzing the intake flow rate and pressure variations.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If capacitive sensors are used to detect substrate position, then measurement capability is provided, but measurement precision deteriorates due to positional displacement and material properties

Engineering Contradiction:

Improvedistance measurement accuracyVSAvoidmeasurement reliability

Core Design Contradiction:

Measurement precisionVSReliability

Solution Approach 1:

The patent replaces capacitive sensors (electrical field-based measurement) with a gas flow-based measurement system. Gas flows through a nozzle toward the substrate, and the gas flow rate or pressure changes as the distance between nozzle and substrate varies, providing a mechanical-fluid measurement alternative that is not affected by material dielectric properties or positional displacement issues

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent uses pneumatic principles by directing gas flow through a nozzle toward the substrate and measuring distance based on gas flow rate or pressure changes. This pneumatic measurement method provides reliable distance detection that is independent of substrate material properties, resolving the limitations of capacitive sensing

Inventive Principle:

Principle #29Pneumatics and hydraulics

2Ease of operation

If fork position is not accurately controlled, then operation simplicity is maintained, but harmful factors increase due to potential contact and breakage

Engineering Contradiction:

Improvetransfer operation simplicityVSAvoidsubstrate breakage risk

Core Design Contradiction:

Ease of operationVSObject-affected harmful factors

Solution Approach 1:

The patent implements feedback control by continuously measuring the distance between the substrate holder and substrate using gas flow rate or pressure sensors, and adjusting the substrate holder position accordingly. This feedback mechanism prevents contact and breakage while maintaining operational simplicity through automated control

Inventive Principle:

Principle #23Feedback

Solution Approach 2:

The patent applies preliminary anti-action by using gas flow measurement to detect potential contact conditions before actual contact occurs. The system adjusts the substrate holder position in advance based on gas flow changes, preventing the harmful effect of substrate breakage before it can happen

Inventive Principle:

Principle #9Preliminary anti-action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables accurate detection of contact or proximity between the substrate holder and interferers, reducing substrate breakage and particle generation by adjusting moving conditions and preventing unintended contact.

Implementation Method 1

a common gas suction mechanism; a pressure sensor configured to measure a pressure of the gas flowing through the nozzle flow path

Methodology Applied

Scientific EffectPressure difference: Pressure Gradient

Implementation Method 2

the flow rate varying according to a distance between an interferer and the one substrate holder

Methodology Applied

Scientific EffectGas flow rate variation: Flow Separation

Data Source

PatentUS12610783B2Substrate transfer apparatus, state determination method, and computer storage medium

Publication Date: 2026.04.21 TOKYO ELECTRON LTD

AI summary

An apparatus transfers a substrate. The apparatus includes: one substrate holder adsorbing and holding the substrate via an adsorption port; a nozzle being provided on a surface of the one substrate holder and allowing gas to pass therethrough; an adsorption flow path being connected to the adsorption port and allowing gas to flow therethrough; and a nozzle flow path being connected to the nozzle and allowing the gas to flow therethrough. The adsorption flow path of at least one of the one substrate holder and another substrate holder and the nozzle flow path are connected to a common gas suction mechanism. A pressure sensor and flow rate sensor are provided for the nozzle flow path. The flow rate of the nozzle flow path is varied according to a distance between an interferer and the one substrate holder and the pressure of the nozzle flow path.