Substrate Inspection Device Dynamic Grouping

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Solution Overview

Problem

Current substrate inspection methods face challenges in accurately detecting defects due to varying states of inspection target wafers, which can lead to pseudo defects and require a large number of reference images, increasing startup effort and complexity.

Innovation Solution

A substrate inspection device and method that dynamically defines groups based on the basic state of wafers, using a setting part to determine group membership and create inspection recipes, allowing for accurate defect inspection without pre-prepared reference images by matching process and image-based features.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If multiple reference images are prepared for different wafer states, then defect inspection accuracy is improved, but startup effort and system complexity increase

Engineering Contradiction:
Improvedefect inspection accuracyVSAvoidsystem complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The system automatically determines wafer groups and creates inspection recipes without requiring manual preparation of reference images for each wafer state. The determination part autonomously analyzes wafer images and processes to identify group memberships, eliminating the need for operators to pre-prepare multiple reference image sets for different wafer conditions.

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The system dynamically adjusts inspection parameters by creating different inspection recipes for different wafer groups. Instead of using fixed reference images, the system changes inspection parameters based on the determined group characteristics, allowing accurate defect inspection adapted to each wafer's specific state without manual intervention.

Inventive Principle:
Principle #35Parameter changes

2Measurement precision

If multiple reference images are prepared for different wafer states, then defect inspection accuracy is improved, but the number of required reference images increases

Engineering Contradiction:
Improvedefect inspection accuracyVSAvoidnumber of reference images
Core Design Contradiction:
Measurement precisionVSQuantity of substance

Solution Approach 1:

The system automatically determines wafer groups and creates inspection recipes without requiring manual preparation of reference images for each wafer state. The determination part autonomously analyzes wafer images and processes to identify group memberships, eliminating the need for operators to pre-prepare multiple reference image sets for different wafer conditions.

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

A single dynamic group determination mechanism serves multiple wafer states and inspection scenarios. Instead of requiring separate reference images for each wafer state, the system uses one universal group determination process that adapts to different wafer conditions by creating appropriate inspection recipes on-the-fly.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Measurement precision

If manual group setting is performed for each wafer type, then inspection accuracy is improved, but processing time and productivity decrease

Engineering Contradiction:
Improveinspection accuracyVSAvoidprocessing speed
Core Design Contradiction:
Measurement precisionVSProductivity

Solution Approach 1:

The determination part automatically performs group determination by analyzing wafer images and process information without requiring manual operator intervention. The system self-services by autonomously identifying wafer groups and creating corresponding inspection recipes, eliminating the time-consuming manual grouping process while maintaining accurate inspection.

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The system performs group determination and inspection recipe creation as preliminary automated actions before the actual defect inspection process. By pre-establishing wafer groups and their corresponding recipes through automatic analysis, the system prepares inspection parameters in advance without manual intervention, enabling fast and accurate inspection execution.

Inventive Principle:
Principle #10Preliminary action

Data Source

PatentUS12148147B2Substrate inspection device, substrate inspection method, and storage medium
Publication Date: 2024.11.19 TOKYO ELECTRON LTD
  • US12148147B2 patent drawing
  • US12148147B2 patent drawing
  • US12148147B2 patent drawing

AI summary

A substrate inspection device for inspecting a substrate, includes: a setting part configured to define a group according to a basic state that is not dependent on a presence or absence of a defect in a substrate and set the defined group for each inspection target substrate; an inspection part configured to perform a defect inspection based on a captured image of the inspection target substrate and an inspection recipe corresponding to the defined group to which the inspection target substrate belongs and including a reference image; a recipe creation part configured to create the inspection recipe for each group; and a determination part configured to perform a determination as to whether a group-setting target substrate, for which the group is set by the setting part, belongs to the group defined by the setting part.