Vision-Based Substrate Inspection for Wafer Count and Tilt Detection

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Solution Overview

Problem

Conventional substrate inspection methods in semiconductor manufacturing can only determine the presence of wafers but fail to discern the quantity or condition, such as inclination or instability, leading to inefficiencies in handling defective substrates during transportation.

Innovation Solution

A substrate inspection apparatus utilizing a vision system with a camera module and illumination module to acquire images, allowing for the determination of substrate presence, quantity, and condition by processing image data to identify regions of interest, binarize, and analyze binary large objects.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If distance measurement method is used to inspect substrates, then the inspection process is simple, but only presence or absence can be determined without quantity or condition information

Engineering Contradiction:
Improveinspection process complexityVSAvoidsubstrate condition information
Core Design Contradiction:
Device complexityVSLoss of information

Solution Approach 1:

The patent replaces the mechanical distance measurement method with an optical vision system consisting of a camera module and illumination module. This substitution enables capture of visual information about substrates including their presence, quantity, and condition (such as inclination and stability) without the limitations of distance measurement alone.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The vision system creates optical copies (images) of the substrates, which can then be analyzed to extract multiple types of information simultaneously. The camera captures visual data that contains information about substrate presence, quantity, and condition, replacing the need for direct physical measurement.

Inventive Principle:
Principle #26Copying

2Measurement precision

If vision system with camera and illumination modules is used, then substrate presence, quantity, and condition can be determined accurately, but device complexity increases

Engineering Contradiction:
Improvesubstrate inspection accuracyVSAvoidinspection apparatus structure
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent combines the camera module and illumination module into an integrated vision system that functions as a unified inspection apparatus. This merging allows simultaneous acquisition of multiple substrate parameters (presence, quantity, condition) through a single coordinated system rather than multiple separate measurement devices.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The vision system is designed to perform multiple inspection functions simultaneously - detecting substrate presence, counting quantity, and assessing condition (inclination, stability). This multi-functionality reduces the need for separate specialized devices for each measurement type.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Device complexity

If conventional distance measurement is used, then the inspection apparatus is simple, but inspection time increases due to inability to discern substrate condition

Engineering Contradiction:
Improveapparatus structureVSAvoidinspection efficiency
Core Design Contradiction:
Device complexityVSProductivity

Solution Approach 1:

The vision system enables continuous inspection of substrates during transfer operations. By capturing images that simultaneously provide presence, quantity, and condition information, the system maintains continuous monitoring capability without requiring multiple sequential measurement steps.

Inventive Principle:
Principle #20Continuity of useful action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables accurate inspection of substrate presence, quantity, and condition, reducing inspection time and improving handling of defective substrates during transportation between batch and single-type equipment.

Implementation Method 1

an illumination module, which illuminates in a direction where the substrates are located

Methodology Applied
Scientific EffectLight emission: Light

Implementation Method 2

a camera module, which acquires images related to the substrates when the substrates are illuminated

Methodology Applied
Scientific EffectLight reflection: Reflection

Data Source

PatentUS12399134B2Substrate inspection apparatus and substrate treatment system including the same
Publication Date: 2025.08.26 SYSTEM ENGINEERING MEGA SOLUTION CO LTD
  • US12399134B2 patent drawing
  • US12399134B2 patent drawing
  • US12399134B2 patent drawing

AI summary

A substrate inspection apparatus inspecting substrates using a vision system, which includes a camera module and an illumination module, and a substrate treatment system including the substrate inspection apparatus are provided. The substrate treatment system includes: a first substrate treatment apparatus; a second substrate treatment apparatus; a transfer unit transporting a container with a plurality of substrates accommodated therein from the first substrate treatment apparatus to the second substrate treatment apparatus; and a substrate inspection apparatus inspecting the substrates, wherein the substrate inspection apparatus includes an illumination module, which illuminates in a direction where the substrates are located, a camera module, which acquires images related to the substrates when the substrates are illuminated, and a control module, which inspects the substrates based on the images.