Integrated Substrate Job Control Across Batch and Sheet-Fed Tools
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Solution Overview
Problem
Existing substrate processing systems require multiple apparatuses to execute a series of processing steps, increasing the operational load on operators due to the need for separate job commands and non-compliance with SEMI standards.
Innovation Solution
A substrate processing system with integrated control device that generates virtual jobs for multiple processing apparatuses, allowing coordinated execution of processing steps without additional software requirements, thus reducing operator load and ensuring compliance with SEMI standards.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If multiple processing apparatuses are used to execute a series of substrate processing steps, then processing functionality and versatility are improved, but operator load increases due to the need for separate job commands to each apparatus
Solution Approach 1:
The patent segments the control function by introducing an integrated control device that separates the command reception function from the job execution function. The integrated control device receives a single integrated job command from the operator and segments it into multiple virtual jobs for distribution to individual processing apparatuses, thereby reducing operator load while maintaining multi-apparatus functionality.
Solution Approach 2:
The integrated control device acts as an intermediary between the operator and multiple processing apparatuses. It receives integrated job commands from the operator, creates appropriate virtual jobs for each apparatus, and manages the coordinated execution across multiple devices, thereby eliminating the need for operators to issue separate commands to each apparatus.
2Reliability
If multiple processing apparatuses are controlled with separate job commands, then each apparatus can be precisely controlled, but compliance with SEMI standards is compromised and system complexity increases
Solution Approach 1:
The integrated control device provides universal control functionality that works with multiple different processing apparatuses through a standardized interface. It can create virtual jobs compatible with SEMI standards and distribute them to various apparatus types, thereby maintaining control precision while ensuring standard compliance and reducing system complexity.
Solution Approach 2:
The integrated control device transforms the control parameters by converting a single integrated job command into multiple virtual jobs with appropriate parameters for each specific apparatus. This parameter transformation maintains the precision needed for each apparatus while presenting a simplified, standardized interface to the operator.
3Productivity
If a host computer introduces new software to control multiple processing apparatuses, then coordination between apparatuses is improved, but the load on the operator managing the host computer increases
Solution Approach 1:
The integrated control device provides self-service functionality by automatically receiving integrated job commands from the operator and autonomously creating and distributing the appropriate virtual jobs to each processing apparatus. This automation eliminates the need for operators to manually coordinate each apparatus, thereby improving coordination efficiency while reducing operator load.
Data Source
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AI summary
A substrate processing system includes a first processing apparatus, a second processing apparatus, and an integrated control device. The first processing apparatus executes first processing on substrates in accordance with a job. The second processing apparatus executes second processing on substrates in accordance with a job. The integrated control device generates a first virtual job and a second virtual job in accordance with a command to create an integrated job, received from an external control device. The first processing apparatus executes at least part of the first processing on substrates in accordance with the first virtual job. The second processing apparatus executes, in accordance with the second virtual job, at least part of the second processing on the substrates that have been processed by the first processing apparatus.