Substrate Joining Hydrophilic Treatment for Strong Vacuum Bonding

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Solution Overview

Problem

Existing substrate joining methods, such as those using reactive ion etching and radical irradiation, often result in insufficient production of hydroxyl groups on joint surfaces, leading to inadequate joint strength between substrates, especially when joining in a vacuum environment.

Innovation Solution

A substrate joining method involving a hydrophilic treatment step that includes nitrogen gas reactive ion etching followed by nitrogen radical treatment, enhancing the formation of hydroxyl groups on the joint surfaces, which are then brought into contact and heated to form strong covalent bonds.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If substrates are joined in the atmosphere with water molecules interposed, then joining can be achieved without vacuum equipment, but large voids occur due to air incorporation

Engineering Contradiction:
Improvejoining process simplicityVSAvoidvoid formation
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent applies vacuum environment (inert environment) during the joining process to prevent air incorporation between substrates. By maintaining vacuum conditions during substrate approach and bonding, the method eliminates the harmful effect of air molecules that would otherwise form large voids, while still allowing water molecules to mediate the bonding process.

Inventive Principle:
Principle #39Inert atmosphere (Inert environment)

2Manufacturing precision

If substrates are joined in a vacuum, then voids are reduced by preventing air incorporation, but insufficient OH groups are produced on joint surfaces leading to inadequate joint strength

Engineering Contradiction:
Improvevoid reductionVSAvoidjoint strength
Core Design Contradiction:
Manufacturing precisionVSStrength

Solution Approach 1:

The patent applies preliminary hydrophilic treatment to the substrate surfaces before joining in vacuum. This pre-treatment introduces sufficient OH groups on the joint surfaces through exposure to water vapor or plasma treatment in the atmosphere prior to vacuum sealing, ensuring that when substrates are joined in vacuum, both void reduction and adequate joint strength are achieved.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent uses water molecules as an intermediary substance that mediates the bonding process. Water molecules serve dual functions: they provide OH groups for forming hydrogen bonds and covalent bonds between substrates, and they enable bonding to occur in vacuum environment without requiring air presence, thus resolving the contradiction between vacuum benefits and OH group production.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Object-affected harmful factors

If substrates are joined while deflecting them in the center, then air incorporation is prevented, but distortion occurs in the substrates and alignment accuracy deteriorates

Engineering Contradiction:
Improveair incorporation preventionVSAvoidalignment accuracy
Core Design Contradiction:
Object-affected harmful factorsVSManufacturing precision

Solution Approach 1:

The patent uses vacuum environment as an inert atmosphere to prevent air incorporation between substrates during joining. By maintaining vacuum conditions, air molecules are excluded from the interface region, eliminating the need for mechanical deflection methods that would cause substrate distortion and alignment errors.

Inventive Principle:
Principle #39Inert atmosphere (Inert environment)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method effectively increases the number of hydroxyl groups on the substrates, improving joint strength and reducing voids by forming a large number of hydrogen bonds that convert to covalent bonds during heating, thereby enhancing the bonding quality between substrates.

Implementation Method 1

a first etching step of performing reactive ion etching using nitrogen gas on the joint surfaces of the substrates

Methodology Applied
Scientific EffectReactive ion etching: Ion Beam

Implementation Method 2

a radical treatment step of performing a radical treatment to irradiate the joint surfaces of the substrates with nitrogen radicals after the first etching step

Methodology Applied
Scientific EffectRadical treatment: Radiation

Implementation Method 3

producing hydroxyl groups (OH groups) on the joint surfaces of the two substrates and bringing into mutual contact and pressurizing the joint surfaces of the two substrates to form the hydrogen bond between the joint surfaces

Methodology Applied
Scientific EffectHydrogen bonding: Chemical Bonding

Implementation Method 4

the water molecules that are interposed between the joint surfaces of substrates can turn into OH groups and then turn into a strong covalent bond through heating

Methodology Applied
Scientific EffectThermal activation: Heating

Data Source

PatentUS11837444B2Substrate joining method, substrate joining system and method for controlling hydrophilic treatment device
Publication Date: 2023.12.05 BONDTECH CO LTD
  • US11837444B2 patent drawing
  • US11837444B2 patent drawing
  • US11837444B2 patent drawing

AI summary

The substrate joining method is a substrate joining method for joying two substrates, including a hydrophilic treatment step of hydrophilizing at least one of respective joint surfaces of the two substrates that are to be joined to each other and a joining step of joining the two substrates after the hydrophilic treatment step. The hydrophilic treatment step includes a step of performing a N2 RIE treatment to perform reactive ion etching using N2 gas on the joint surfaces of the substrates and a step of performing a N2 radical treatment to irradiate the joint surfaces of the substrates with N2 radicals after the step of performing the N2 RIE treatment.