Single Crystal Substrate Warpage Control via Non-Parallel Laser Trajectories

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Solution Overview

Problem

Existing methods for controlling warpage of substrates using laser irradiation are inconsistent and fail to achieve uniform warpage control due to the orientation of laser beam trajectories relative to the crystal axes of the substrate.

Innovation Solution

Irradiating a single crystal substrate with a laser or charged particles to form non-crystalline regions along striped patterns that are intentionally oriented non-parallel to the crystal axes, ensuring that none of the striped patterns are parallel to any crystal axes in a plane parallel to the substrate surface, thereby uniformly distributing warpage across the substrate.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If laser beam irradiation is performed with trajectories parallel to crystal axes, then the irradiation process is simple and efficient, but the warpage control becomes unstable and non-uniform

Engineering Contradiction:
Improveirradiation efficiencyVSAvoidwarpage control precision
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The patent applies asymmetry by intentionally setting the laser beam trajectory at an angle that is not parallel to the crystal axes of the sapphire substrate. This asymmetric orientation ensures that the laser-induced non-crystalline regions are distributed uniformly across the substrate, preventing directional bias in warpage and achieving stable, uniform warpage control while maintaining irradiation efficiency.

Inventive Principle:
Principle #4Asymmetry

2Manufacturing precision

If multiple irradiation directions are used to achieve uniform warpage control, then warpage stability improves, but the irradiation process complexity increases

Engineering Contradiction:
Improvewarpage control precisionVSAvoidirradiation process complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent changes the key parameter of trajectory orientation angle, setting it to a specific value that is not parallel to crystal axes. This single parameter change achieves uniform warpage control in one irradiation pass, eliminating the need for multiple irradiation directions and thereby maintaining process simplicity while achieving high manufacturing precision.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach allows for stable and uniform warpage control of the substrate, preventing localized warpage concentrations and enabling the production of flat multi-layer substrates by canceling out warpage caused by differences in linear expansion coefficients between substrate layers.

Implementation Method 1

irradiating a single crystal substrate with a beam of laser or charged particles

Methodology Applied
Scientific EffectLaser irradiation: Laser

Implementation Method 2

Non-crystalline regions are formed in the single crystal substrate along the trajectory

Methodology Applied
Scientific EffectPhase change from crystalline to non-crystalline: Phase Change

Implementation Method 3

The repetition of the irradiation changes warpage of the single crystal substrate

Methodology Applied
Scientific EffectWarpage control through stress modification: Deformation

Data Source

PatentUS9330919B1Method for manufacturing substrate
Publication Date: 2016.05.03 DENSO CORP
  • US9330919B1 patent drawing
  • US9330919B1 patent drawing
  • US9330919B1 patent drawing

AI summary

A method for manufacturing a substrate is provided. The method includes irradiating a single crystal substrate with a beam of laser or charged particles while moving an irradiation point of the beam with respect to the single crystal substrate so that a trajectory of the irradiation point on a surface of the single crystal substrate describes a striped pattern of straight lines. Non-crystalline regions are formed in the single crystal substrate along the trajectory. The irradiation is repeated multiple times so that directions of the striped patterns are different from each other among the multiple times of irradiation. The repetition of the irradiation changes warpage of the single crystal substrate. All of directions of the straight lines described in the multiple times of irradiation are not parallel to any of directions of crystal axes of the single crystal substrate in a plane parallel to the surface.