Substrate Treatment Lid Structure for Bubble-Free Etching Uniformity
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Solution Overview
Problem
Existing substrate treatment apparatuses face issues with non-uniform etching due to nitrogen bubbles accumulating at the interface between the lid and treatment fluid, leading to incomplete etching and reduced in-plane uniformity, especially when the lid is immersed in the fluid.
Innovation Solution
The substrate treatment apparatus features a lid design with sloped surfaces that guide bubbles diagonally upward and out of the treatment chamber, preventing bubble retention above the substrate and maintaining uniformity by ensuring the bubbles are smoothly released.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If bubbles of nitrogen gas are continuously supplied to reduce dissolved oxygen concentration, then etching rate increases, but bubbles gather at the interface between the lid and treatment fluid and contact upper ends of substrates causing non-uniform etching
Solution Approach 1:
The harmful bubbles are extracted from the treatment chamber by providing a dedicated bubble discharge path through the lid structure. The lid includes a bubble discharge hole that allows bubbles to escape from the treatment fluid without contacting the substrates, thereby removing the harmful factor (bubbles) from the system while maintaining continuous nitrogen gas supply for high etching rate
Solution Approach 2:
The lid acts as an intermediary structure between the treatment fluid and the substrates. By incorporating a bubble discharge hole in the lid, bubbles are diverted through this intermediate structure rather than directly contacting the substrates. The lid mediates the interaction by providing an alternative path for bubble discharge that prevents harmful contact while allowing the nitrogen gas supply to continue
2Quantity of substance
If the lid is immersed into the treatment fluid to reduce oxygen dissolution, then oxygen concentration decreases, but bubbles accumulate at the lid-fluid interface and contact substrates
Solution Approach 1:
Bubbles are extracted from the accumulation zone at the lid-fluid interface by providing a discharge hole in the lid. This allows bubbles to be removed from the system through a dedicated path that bypasses the substrates, preventing contact while maintaining the lid's immersion for oxygen exclusion
Solution Approach 2:
The bubble discharge hole utilizes pneumatic principles to allow gas bubbles to escape from the liquid treatment fluid through the lid structure. The hole provides a pneumatic pathway that enables bubble discharge while the lid remains immersed in the fluid to prevent oxygen dissolution, combining gas-liquid separation with chemical treatment
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design effectively prevents bubble contact with the substrate, maintaining etching uniformity and enhancing the etching rate by reducing oxygen concentration in the treatment fluid.
Implementation Method 1
The bubbles supplied from the bubble supply pipe into the treatment fluid are guided diagonally upward along the first sloped surface and the second sloped surface, and smoothly released outside the treatment chamber
Implementation Method 2
placing a lid (a cover) on a treatment chamber and immersing a part of the lid into a fluid level of a treatment fluid to reduce dissolving oxygen from an atmosphere into the treatment fluid
Data Source
AI summary
Substrates are immersed in a treatment fluid stored in a treatment chamber, and subjected to a surface treatment. A first lid and a second lid cover an upper opening of the treatment chamber. The first lid and the second lid each include sloped surfaces. At least a part of the first lid and the second lid is immersed in the treatment fluid. During the treatment on the substrates, a plurality of bubble supply pipes eject bubbles into the treatment fluid. The sloped surfaces formed on the first lid and the second lid guide the bubbles reaching an interface between the treatment fluid, the first lid, and the second lid diagonally upward. Thus, the bubbles are smoothly released outside the treatment chamber. This can eliminate retention of the bubbles, avoid contacts between the bubbles and the substrates, and suppress a decrease in the treatment uniformity.