Substrate Lift-Rotation Stage for Uniform Vacuum Film Deposition
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Solution Overview
Problem
Existing vacuum processing apparatuses face challenges in assembling the stage symmetrically relative to the substrate center and ensuring symmetrical gas flow, leading to deviations in film thickness distribution during processes like sputtering, and existing solutions compromise substrate positioning or impair electrostatic sucking and heating functions.
Innovation Solution
A vacuum processing apparatus with a lifting/rotation mechanism featuring a driving rod and substrate supporting body with a base end plate and arm plates that allow for precise rotation of the substrate about its center without positional deviation, ensuring the arm plates do not interfere with electrostatic chuck or heating mechanisms.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If the substrate supporting body is lifted by bringing it into contact with the central region of the substrate, then the substrate can be rotated to deviate the phase, but the substrate may give rise to a positional deviation at the time of lifting and rotating
Solution Approach 1:
The substrate supporting body is divided into a base end plate part that contacts the central region and multiple arm plate parts that contact peripheral portions. This segmentation allows the peripheral arm plate parts to provide positioning references that prevent positional deviation during lifting and rotation, while the central base end plate part enables rotation capability.
2Manufacturing precision
If the area of contact of the substrate supporting body with the substrate is increased to prevent positional deviation, then positioning accuracy improves, but the function of sucking the substrate and heating the substrate with good in-plane uniformity is impaired
Solution Approach 1:
The substrate supporting body has different contact regions with different functions: the base end plate part contacts the central region for rotation enablement, while the arm plate parts contact peripheral portions for positioning. This local differentiation allows positioning accuracy to be achieved without interfering with the central region's electrostatic sucking and heating functions.
3Manufacturing precision
If the substrate is rotated inside another vacuum chamber to deviate the phase, then film thickness distribution improves, but the productivity is considerably poor due to temporary interruption and transfer
Solution Approach 1:
The lifting/rotation mechanism is integrated into the stage inside the original vacuum chamber, merging the rotation function with the existing processing chamber. This eliminates the need to transfer the substrate to another chamber for rotation, thereby maintaining film thickness uniformity while significantly improving productivity by avoiding processing interruptions.
4Ease of manufacture
If the vacuum processing apparatus is assembled with certain tolerance without point symmetry, then manufacturing complexity is reduced, but deviation occurs in the in-plane film thickness distribution of the substrate
Solution Approach 1:
The substrate supporting body is designed to be movable and rotatable, transforming a static asymmetric assembly into a dynamic system. By enabling the substrate to be rotated to different phases during processing, the system compensates for the asymmetric assembly, achieving uniform film thickness distribution without requiring point-symmetric manufacturing.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables precise rotation of substrates without positional deviation, maintains uniform electrostatic sucking and heating functions, and prevents bias irregularities during vacuum processing, improving in-plane film thickness distribution and productivity.
Implementation Method 1
a substrate supporting body having a base end plate part capable of contacting a central region, including a substrate center, of the to-be-processed substrate and also having at least two arm plate parts elongated from the base end plate part outward so as to be capable of contacting such a portion of the to-be-processed substrate as is lying diametrically
Implementation Method 2
a driving rod built into the stage so as to be moveable up and down and also be rotatable
Implementation Method 3
The substrate supporting body also has at least two arm plate parts elongated from the base end plate part outward thereof so as to be capable of contacting such a portion of the to-be-processed substrate as is lying diametrically
Data Source
AI summary
A vacuum processing apparatus of this invention having a stage on which is disposed the to-be-processed substrate further has a lifting/rotation mechanism capable of lifting the to-be-processed substrate lying on the stage off from an upper surface of the stage to a predetermined height position so that, at this lifted position, the to-be-processed substrate is capable of rotation about a substrate center by a predetermined rotational angle. The lifting/rotation mechanism has: a driving rod built into the stage so as to be moveable up and down and also be rotatable; and a substrate supporting body having a base end plate part capable of contacting a central region, including the substrate center, of the to-be-processed substrate. The substrate supporting body further has at least two arm plate parts elongated from the base end plate part outward thereof.