Substrate Processing Light Irradiation Uniformity Control
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Solution Overview
Problem
Existing substrate processing technologies face challenges in achieving uniform light irradiation across the surface of substrates, leading to inconsistencies in processing outcomes.
Innovation Solution
A substrate processing apparatus that includes a light radiator to focus light into a smaller irradiation area than the processing target area, with a driver to move this area in two intersecting directions and a controller to follow a set movement pattern, ensuring uniform coverage of the entire processing target area.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a light radiator is used to radiate light for processing, then processing capability is improved, but uniformity of irradiation amount across the substrate surface deteriorates
Solution Approach 1:
The substrate surface is divided into multiple irradiation regions, with each region receiving light from a dedicated light radiator. This segmentation allows independent control of irradiation parameters for each region, enabling uniform processing across the entire substrate surface despite using multiple discrete light sources.
Solution Approach 2:
Each light radiator is positioned and configured to provide optimized local irradiation to its specific target region on the substrate. The irradiation conditions (intensity, angle, duration) can be locally adjusted for each radiator, ensuring that each region receives the precise amount of light needed while maintaining overall uniformity across the substrate.
2Illumination intensity
If light is radiated into a smaller irradiation area than the processing target area, then irradiation intensity is improved, but coverage area deteriorates
Solution Approach 1:
The processing target area is segmented into multiple smaller irradiation areas, each covered by a dedicated light radiator. This allows each radiator to concentrate light into a small, intense beam while the collective array of radiators covers the entire large processing area through coordinated positioning and control.
Solution Approach 2:
Multiple light radiators are arranged in a two-dimensional array configuration, transforming the coverage problem from a single-dimension trade-off to a multi-dimensional solution. By distributing radiators across the substrate surface in specific patterns, the system achieves both high local intensity and complete area coverage simultaneously.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enhances the uniformity of light irradiation across the substrate surface, allowing for precise control of the irradiation amount and improving processing outcomes by minimizing variations in light exposure.
Implementation Method 1
a light radiator configured to radiate light for processing into a processing chamber
Data Source
AI summary
There is provided a substrate processing apparatus including: a light radiator configured to radiate a light for processing into an irradiation area which is smaller than a processing target area of a surface of a substrate; a driver configured to move the irradiation area in two directions that cross each other in a plane along the surface of the substrate; and a controller configured to control the driver to move an irradiation position in two directions according to a movement pattern which has been set to radiate the light to an entire area of the processing target area.