Substrate Fluid Supply Line Draining for Temperature and Particle Control
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Solution Overview
Problem
Conventional substrate treatment using supercritical fluids faces challenges in achieving proper process temperatures and minimizing particle generation in fluid supply units during the treatment process.
Innovation Solution
A substrate treating apparatus and method that includes a fluid supply unit with a controller to drain and stabilize the fluid supply lines before introducing the supercritical fluid into the treatment chamber, ensuring the fluid reaches the desired process temperature and minimizes particle presence, using a branched line connected to an exhaust unit to manage fluid flow and temperature stabilization.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the supply lines are not emptied and cooled between batches, then the apparatus operation is continuous and efficient, but particles are generated in the pipeline and introduced into the treatment space
Solution Approach 1:
The invention extracts and removes the harmful factor (particles) by introducing a cleaning gas flow through the supply lines between batches. This cleaning flow exits through a dedicated discharge port, taking particles out of the system before the next treatment cycle begins, thus preventing particle introduction into the treatment space while maintaining continuous operation efficiency
Solution Approach 2:
The invention performs preliminary cleaning of the supply lines by introducing cleaning gas flow before the next batch treatment begins. This preliminary action removes particles from the pipeline interior, ensuring that when the next treatment cycle starts, the supply lines are clean and will not introduce particles into the treatment space
2Ease of operation
If the supply lines are naturally cooled between batches, then the system is simple to operate, but the supercritical fluid does not reach the process temperature and treatment effectiveness is reduced
Solution Approach 1:
The invention introduces a cleaning gas flow as an intermediary substance that serves dual purposes: it cleans particles from the supply lines and simultaneously heats the lines through the thermal energy of the gas flow. This intermediary approach solves both the temperature deficiency and particle contamination problems without complicating the system operation
Solution Approach 2:
The invention changes the parameter of the gas flow (introducing it at a temperature higher than the supply lines) to transfer thermal energy to the supply lines. This parameter change enables the supply lines to reach the required process temperature for effective supercritical fluid treatment while maintaining operational simplicity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution ensures efficient and reliable substrate treatment by maintaining the supercritical fluid at a proper temperature and reducing particle generation, enhancing the treatment process's uniformity and reliability.
Implementation Method 1
dissolving the organic solvent in the supercritical fluid
Implementation Method 2
a heater that heats the fluid in the supply line
Implementation Method 3
the fluid is drained from the supply line through the branch line shortly before the fluid is supplied into the process chamber
Data Source
AI summary
The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a process chamber that provides a treatment space, in which a substrate is treated, in an interior thereof, a fluid supply unit that supplies a fluid into the process chamber, and an exhaust units including an exhaust line, through which the fluid in the process chamber is exhausted, the fluid supply unit includes a supply tank, in which the fluid is stored, a supply line connecting the supply tank and the process chamber, a branch line branched from the supply line at a first point of the supply line, and a controller that controls the fluid supply unit, and the controller controls the fluid supply unit such that the fluid is drained from the supply line through the branch line shortly before the fluid is supplied into the process chamber.