Substrate Processing Liquid Replenishment for Contamination Control

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Solution Overview

Problem

Existing substrate processing systems face challenges in efficiently managing the storage and replenishment of processing liquids, leading to potential contamination and inefficiencies due to the accumulation of particles and eluate in the processing liquid, which can affect the quality of substrate processing.

Innovation Solution

A substrate processing apparatus and method that includes a tank, circulation line, branch line, processing part, discharge part, and supply part, controlled by a controller with determination, replenishment, and discharge controllers to manage the storage amount and quality of processing liquid, ensuring it remains within optimal limits by replenishing and discharging as needed.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the processing liquid is continuously circulated and reused in the tank, then productivity is improved by reducing liquid exchange frequency, but manufacturing precision deteriorates due to particle accumulation and eluate contamination in the processing liquid

Engineering Contradiction:
Improveliquid exchange frequencyVSAvoidsubstrate processing quality
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The system implements a feedback mechanism where the controller continuously monitors the storage amount of processing liquid in the tank and automatically triggers discharge and replenishment operations when the storage amount falls below a predetermined threshold, ensuring continuous circulation of clean processing liquid without manual intervention

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The system performs self-service through automated discharge and replenishment operations. The controller automatically discharges a predetermined amount of processing liquid from the tank and replenishes it with fresh liquid from the supply part, maintaining optimal liquid levels and cleanliness without requiring external monitoring or manual operation

Inventive Principle:
Principle #25Self-service

2Manufacturing precision

If the storage amount of processing liquid in the tank is reduced, then manufacturing precision is improved by minimizing particle accumulation, but productivity deteriorates due to frequent discharge and replenishment operations

Engineering Contradiction:
Improveprocessing liquid cleanlinessVSAvoidoperational efficiency
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The system dynamically adjusts the storage amount parameter of processing liquid in the tank by automatically discharging a predetermined amount when the storage amount exceeds a threshold, and replenishing when it falls below the threshold, thereby maintaining optimal liquid cleanliness and storage levels through parameter-based control

Inventive Principle:
Principle #35Parameter changes

3Ease of operation

If automated discharge and replenishment operations are implemented, then ease of operation is improved by eliminating manual liquid management, but device complexity increases due to additional control mechanisms and components

Engineering Contradiction:
Improveliquid management automationVSAvoidcontrol system complexity
Core Design Contradiction:
Ease of operationVSDevice complexity

Solution Approach 1:

The controller performs multiple functions including monitoring the storage amount of processing liquid, determining when discharge is needed, controlling the discharge operation, managing replenishment operations, and maintaining circulation, thereby simplifying the overall system architecture through a multi-functional control unit rather than separate dedicated components for each function

Inventive Principle:
Principle #6Universality (Multi-functionality)

Data Source

PatentUS20250232988A1Substrate processing apparatus and substrate processing method
Publication Date: 2025.07.17 TOKYO ELECTRON LTD
  • US20250232988A1 patent drawing
  • US20250232988A1 patent drawing
  • US20250232988A1 patent drawing

AI summary

An apparatus includes: a tank storing a processing liquid; a circulation line; a branch line; a processing part for supplying the processing liquid to a substrate at the branch line; a discharge part for reducing a storage amount of the processing liquid; a supply part for supplying a new processing liquid to the tank; and a controller including: a first determination part for determining whether the storage amount is less than a lower limit value; a first replenishment controller for replenishing the processing liquid to the tank when the storage amount is less than the lower limit value; a calculation part for calculating a replenishment amount of the processing liquid; and a second replenishment controller for reducing the storage amount and replenishing the processing liquid to the tank when a calculation value of the replenishment amount is less than a set value.