Substrate Liquid Film Detection for Stable Drying Yield
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Solution Overview
Problem
Conventional substrate processing apparatuses often face issues with improper liquid film formation on substrates, leading to poor yield due to inadequate detection and control of liquid amounts and coating states during the drying process.
Innovation Solution
Incorporating a substrate processing apparatus with a liquid amount detecting part and a coating state detecting part to monitor and regulate the liquid film on substrates before and after the drying process, ensuring the liquid film covers the pattern and falls within a predetermined range, thereby optimizing the drying process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If a drying process is performed on a substrate with a liquid film, then the substrate can be dried effectively, but the yield deteriorates when the liquid film is improperly formed
Solution Approach 1:
The patent applies preliminary action by detecting the liquid film amount and coating state before the drying process begins. The liquid amount detecting part measures the liquid film thickness, and the coating state detecting part verifies proper coverage of the substrate pattern. This pre-detection allows the system to identify and correct improper liquid film formation before drying, preventing yield loss from defective substrates.
2Productivity
If detection devices are added to monitor liquid film properties, then substrate yield improves, but device complexity increases
Solution Approach 1:
The patent implements multi-functionality by designing detection devices that can identify multiple types of defects simultaneously. The liquid amount detecting part and coating state detecting part work together to detect various liquid film formation issues in a single integrated system, reducing the need for multiple separate detection devices and minimizing overall system complexity while maintaining high substrate yield.
Data Source
AI summary
There is provided a substrate processing apparatus comprising a liquid amount detecting part configured to detect a liquid amount of a liquid film formed on a substrate; and a coating state detecting part configured to detect a coating state of the substrate with the liquid film formed thereon.