Substrate Processing Liquid Film Transition
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In existing substrate processing methods, the front surface of substrates is exposed during the transition from chemical liquid treatment to rinsing, risking particle adherence and contamination, as the method of Patent Document 1 fails to maintain continuous liquid coverage, leading to potential particle adherence and incomplete rinsing.
Innovation Solution
A substrate processing method that maintains a liquid film on the substrate's surface throughout the chemical liquid treatment and rinsing process by transitioning from a chemical liquid puddle step to a puddle rinse step without exposing the surface, using a chemical liquid puddle step to hold a chemical liquid film and then replacing it with a rinse liquid film, ensuring continuous coverage and preventing particle adherence.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If the substrate rotation speed is decreased to zero or low speed during rinsing to form a puddled liquid film, then the liquid film can be held on the substrate surface without flowing off, but the transition from chemical liquid treatment to rinsing exposes the substrate surface, causing particle adherence and contamination
Solution Approach 1:
The substrate rotation speed is decreased to zero or low speed before the chemical liquid treatment is completely finished, so that the rinsing liquid film can be formed and held on the substrate surface in advance. This preliminary action ensures continuous liquid coverage during the transition from chemical liquid treatment to rinsing, preventing the substrate surface from being exposed and avoiding particle adherence.
2Manufacturing precision
If the substrate rotates at high speed during chemical liquid treatment, then the chemical liquid spreads uniformly across the substrate surface, but the liquid flows off quickly, making it difficult to maintain a stable liquid film for thorough treatment
Solution Approach 1:
The substrate rotation speed is dynamically adjusted during the processing sequence. During chemical liquid treatment, the substrate rotates at high speed to spread the chemical liquid uniformly. When transitioning to rinsing, the rotation speed is decreased to zero or low speed to hold the rinsing liquid film on the substrate surface. This dynamic adjustment of rotation speed allows both uniform chemical treatment and stable liquid film retention.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method ensures the substrate's surface remains covered throughout the process, preventing particle adherence and ensuring thorough rinsing, thereby improving cleanliness and maintaining in-plane uniformity of chemical treatment rates across the substrate.
Implementation Method 1
a substrate holding unit that holds a substrate in a horizontal posture
Implementation Method 2
a state in which the liquid stagnates on the front surface of the substrate because of surface tension so as to form a liquid film
Data Source
AI summary
This substrate processing method includes supplying a chemical liquid to an upper surface of a substrate and rinsing away the chemical liquid adhering to the upper surface of the substrate by holding a puddled rinse liquid on the substrate while maintaining a rotation speed of the substrate at a zero or low speed, and a chemical liquid puddle step of holding a liquid film of a puddled chemical liquid on the upper surface of the substrate while maintaining the rotation speed of the substrate at a zero or low speed, and the rinsing step is performed subsequent to finishing the chemical liquid puddle step, and the rinsing step includes supplying a rinse liquid to the upper surface of the substrate and then replacing the liquid film of the chemical liquid held on the upper surface of the substrate with the rinse liquid.