Substrate Liquid Mixing for Precise Cleaning and Etching
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Solution Overview
Problem
Existing substrate treatment technologies lack the ability to freely prepare mixed solutions for cleaning and etching treatments, limiting user flexibility and efficiency in addressing substrate-specific requirements.
Innovation Solution
A substrate treatment apparatus and method that allows for the preparation of mixed solutions with precise control over the ratios of main solutions, additives, oxidants, and etching agents, using a substrate supporter and liquid supplier to apply these agents to the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a mixed solution with a plurality of agents is prepared for cleaning or etching treatment, then the cleaning power and etching selectivity are improved, but the complexity of preparing the mixture with precise concentrations and amounts increases
Solution Approach 1:
The liquid supplier is divided into multiple independent liquid supply units, each dedicated to supplying a specific agent (cleaning agent, oxidizing agent, etching agent). This segmentation allows each unit to independently control the supply of its designated agent, simplifying the overall mixing process while maintaining precise control over the mixed solution composition.
Solution Approach 2:
The liquid supplier is designed with multi-functionality to supply different types of agents (cleaning agents, oxidizing agents, etching agents) through a unified system. This universal design enables the system to handle various agent combinations without requiring separate preparation systems for each type of mixed solution.
2Adaptability or versatility
If the agent composition is made freely adjustable for different substrate requirements, then the adaptability and efficiency of substrate treatment are improved, but the complexity of controlling the mixture composition increases
Solution Approach 1:
The liquid supply system incorporates dynamic control capabilities where the liquid supply units can adjust their operation based on real-time process requirements. This dynamic adjustment allows the system to freely vary agent compositions for different substrate types while maintaining simple control through automated coordination of the supply units.
Solution Approach 2:
The system enables users to independently control and adjust the agent composition according to their specific substrate treatment needs. Each liquid supply unit can be independently configured and controlled, allowing end-users to optimize the mixed solution composition without requiring complex external control systems.
3Manufacturing precision
If precise control over agent concentrations and amounts is implemented, then the manufacturing precision of the mixed solution is improved, but the ease of operation deteriorates
Solution Approach 1:
The system replaces manual mixing operations with an automated liquid supply mechanism. The liquid supply units automatically control the concentration and amount of each agent supplied to the mixed solution, eliminating the need for manual measurement and mixing while maintaining high precision composition control.
Solution Approach 2:
The system controls the composition of the mixed solution by adjusting parameters such as the supply rate and concentration of each agent from independent liquid supply units. This parameter-based control approach enables precise composition control while simplifying operation, as users only need to set desired parameters rather than manually prepare mixtures.
Data Source
AI summary
A substrate supporter that supports a substrate and a liquid supplier that supplies a liquid to a surface of the substrate supported by the substrate supporter. The liquid supplier supplies the substrate with a mixed solution prepared in a predetermined ratio of a main solution, pure water, and one or more of an additive, an oxidant, and an etching agent.