Substrate Recess Liquid Removal by Rotation and Guard Switching
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Solution Overview
Problem
The existing substrate processing methods and apparatuses require complex configurations to supply IPA steam and nitrogen gas for removing processing liquids from recess portions on substrates, which complicates the process.
Innovation Solution
A substrate processing method and apparatus that involves a series of chemical liquid steps, rinsing steps, and rotation-based removal steps, utilizing multiple guards to receive and recover processing liquids, without the need for IPA steam or nitrogen gas.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If IPA steam and nitrogen gas are used to remove processing liquid from recess portions, then the processing liquid can be effectively removed, but the configuration becomes complicated
Solution Approach 1:
The patent extracts and eliminates the complex IPA steam supply and nitrogen gas supply configurations from the substrate processing apparatus. Instead of using these complex gas-based systems, the invention uses a simplified liquid-based removal method where processing liquid is removed by centrifugal force during substrate rotation, thereby achieving the same removal effectiveness without the complicated gas supply infrastructure
Solution Approach 2:
The patent replaces the mechanical gas supply systems (IPA steam supply mechanism and nitrogen gas supply mechanism) with a simpler mechanical rotation-based removal system. The substrate is rotated to generate centrifugal force that removes the processing liquid from recess portions, substituting complex gas-based mechanical systems with a simpler rotation-based mechanical system
2Productivity
If multiple guards are used to receive and recover processing liquids, then liquid recovery efficiency is improved, but the device structure becomes more complex
Solution Approach 1:
The patent segments the guard structure into multiple functional zones (first guard, second guard, third guard) that are spatially distributed around the substrate rotation path. Each guard is positioned to receive processing liquid at different stages of the rotation cycle, allowing simultaneous recovery of different liquid streams. This segmentation enables high recovery efficiency while keeping each individual guard component relatively simple in structure
Solution Approach 2:
The patent transitions from a single-plane guard structure to a three-dimensional arrangement of multiple guards positioned at different angular positions around the substrate. By utilizing the rotational dimension, the system can have multiple guards operating simultaneously in different spatial locations, increasing recovery capacity without significantly increasing the complexity of each individual guard structure
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies the configuration for removing processing liquids from substrates, effectively addresses the complexity of existing methods, and ensures efficient processing even for substrates with high aspect ratio patterns.
Implementation Method 1
a removal step of rotating the substrate in a state in which supply of the first rinse liquid is stopped, and discharging the first rinse liquid from the recess portion
Implementation Method 2
a first chemical liquid step of supplying a first chemical liquid to the substrate... a second chemical liquid step of supplying a second chemical liquid to the substrate
Data Source
AI summary
A substrate processing method includes a first chemical liquid step of supplying a first chemical liquid to the substrate, a rinsing step of supplying a rinse liquid to the substrate, a removal step of rotating the substrate in a state in which the supply of the rinse liquid is stopped, and discharging the rinse liquid from a recess portion, and removing the rinse liquid from the substrate, and a second chemical liquid step of supplying a second chemical liquid to the substrate from which the rinse liquid has been removed. In the first chemical liquid step, the first chemical liquid discharged from the rotating substrate is received by a first guard. In the rinsing step, the first guard is switched to a second guard. In the removal step and in the second chemical liquid step, the first rinse liquid and the second chemical liquid discharged from the rotating substrate are received by the second guard.