Substrate Cleaning Liquid Circulation for Stable Temperature Control

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Solution Overview

Problem

Existing substrate cleaning apparatuses face issues with temperature fluctuations in chemical liquids, leading to particle agglomeration and poor cleaning effectiveness, which affects product yield.

Innovation Solution

A substrate processing apparatus with a closed-loop system involving multiple pipelines and temperature controllers to maintain consistent chemical liquid temperature, using heaters and pumps to regulate and circulate the liquid, ensuring uniform temperature distribution across tanks.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If chemical liquid is temporarily stored in the recovery tank after cleaning, then the cleaning process can be completed, but the temperature of the chemical liquid drops significantly (up to 20°C difference)

Engineering Contradiction:
Improvecleaning effectVSAvoidchemical liquid temperature
Core Design Contradiction:
ReliabilityVSTemperature

Solution Approach 1:

The patent applies preliminary action by heating the chemical liquid in the recovery tank before it is transferred back to the supply tank. The heating unit pre-heats the liquid during storage, so when it returns to the supply tank, the temperature difference is minimized. This prevents temperature drop from causing particle agglomeration and maintains consistent cleaning effectiveness throughout the recycling process.

Inventive Principle:
Principle #10Preliminary action

2Productivity

If the chemical liquid temperature fluctuates during recycling, then the liquid can be reused, but particles in the chemical liquid form agglomerates

Engineering Contradiction:
Improveliquid recyclingVSAvoidchemical liquid composition stability
Core Design Contradiction:
ProductivityVSStability of the object's composition

Solution Approach 1:

The patent implements feedback control by using a temperature sensor to continuously monitor the chemical liquid temperature in the recovery tank and adjusting the heating unit accordingly. When the temperature drops below the preset value, the heating unit activates to maintain the temperature within the required range, preventing particle agglomeration while enabling continuous recycling of the chemical liquid.

Inventive Principle:
Principle #23Feedback

3Device complexity

If the temperature difference between recovery tank and supply tank is large, then the recycling process is simpler, but the temperature control difficulty increases

Engineering Contradiction:
Improverecycling system complexityVSAvoidtemperature control difficulty
Core Design Contradiction:
Device complexityVSDifficulty of detecting and measuring

Solution Approach 1:

The patent introduces a heating unit as an intermediary element between the recovery tank and supply tank. This heating unit acts as a temperature buffer, gradually heating the chemical liquid during storage to reduce the temperature difference before transfer. This intermediary heating mechanism simplifies the overall temperature control system by preventing extreme temperature fluctuations, making temperature management more manageable.

Inventive Principle:
Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The apparatus effectively maintains chemical liquid temperature, reducing fluctuations and improving cleaning efficacy, thereby enhancing product yield.

Implementation Method 1

a first heater, configured to heat the chemical liquid flowing through the first pipeline

Methodology Applied
Scientific EffectHeating: Heating

Implementation Method 2

a first circulating pump, configured to make the chemical liquid flow from the liquid supply tank back to the liquid supply tank through the first pipeline

Methodology Applied
Scientific EffectPumping: Pump

Data Source

PatentUS12610777B2Substrate processing apparatus
Publication Date: 2026.04.21 ACM RES (SHANGHAI) INC
  • US12610777B2 patent drawing
  • US12610777B2 patent drawing

AI summary

Disclosed in an embodiment of the present invention is a substrate processing apparatus, comprising a processing chamber, a liquid supply tank and a recovery tank. A first pipeline connects a first liquid inlet and a liquid outlet of the liquid supply tank. A second pipeline connects the first pipeline and a liquid inlet of the processing chamber. A third pipeline connects the first pipeline and a first liquid inlet of the recovery tank. A fourth pipeline connects a liquid outlet of the processing chamber and a second liquid inlet of the recovery tank. A fifth pipeline connects a liquid outlet of the recovery tank and a second liquid inlet of the liquid supply tank.