Substrate Loading Groove Structure for Non-Contact Cleaning
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Solution Overview
Problem
Existing substrate loading stations can cause damage to substrates during handling and cleaning processes, leading to potential scratches and contamination from residual cleaning solutions.
Innovation Solution
A substrate loading station design featuring symmetrical holding grooves and inclined surfaces that accommodate substrates without direct contact, preventing damage and containing cleaning solution residues within grooves.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If substrates are held directly by holding portions during cleaning process, then cleaning can be performed, but substrate damage and contamination from residual cleaning solutions occur
Solution Approach 1:
The holding groove is segmented into multiple functional regions: a first groove for substrate placement, a second groove extending from the first groove, and multiple third grooves for cleaning solution accumulation. This segmentation allows the cleaning solution to be contained in specific areas away from the substrate, enabling effective cleaning while preventing contamination and damage to the substrate.
Solution Approach 2:
Different regions of the holding groove are designed with different properties: the first groove provides substrate support, the second groove acts as a transition channel, and the third grooves serve as cleaning solution reservoirs. This local differentiation ensures that cleaning solutions are directed to specific areas where they can clean effectively without contacting the substrate directly, thus preventing damage and contamination.
2Ease of manufacture
If cleaning solution is applied during substrate handling, then cleaning is achieved, but residual cleaning solutions cause contamination
Solution Approach 1:
The design extracts the cleaning solution from the substrate area by providing dedicated third grooves that are spatially separated from the substrate placement region. These third grooves act as separate containers that collect and retain cleaning solutions, effectively removing the potential source of contamination from the substrate environment while maintaining cleaning functionality.
Solution Approach 2:
The second groove serves as an intermediary structure that connects the first groove (substrate area) and the third grooves (cleaning solution reservoirs). This intermediate channel allows the cleaning solution to be delivered to the cleaning area while preventing direct contact between the substrate and cleaning solution, thus mediating between the cleaning function and substrate protection requirements.
Data Source
AI summary
A substrate loading station includes: a first holding portion having a first holding groove defined in a first surface thereof; and a second holding portion facing the first holding portion and configured to hold a window substrate together with the first holding portion. The first surface of the first holding portion faces the second holding portion, and the first holding groove includes: a first groove extending from the first surface toward a second surface of the first holding portion, which is opposite to the first surface, along a first direction; and a second groove extending from an end of the first groove toward both sides of the first holding portion, which are opposite to each other in a second direction crossing the first direction.