Substrate Mapping Course Adjustment for Inclined Wafer Arrays
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The existing substrate mapping technologies face reduced detection accuracy due to changes in the relative spatial relationship between the mapping sensor and substrates when the substrate array direction inclines relative to the transfer robot, leading to erroneous detection and interference.
Innovation Solution
A substrate mapping device with a mapping sensor and a control device that sets a first and second mapping position, allowing the sensor to move along a defined course to accurately detect substrates regardless of inclination, by calculating positions based on reference points and setting a mapping course that accounts for the arrayed direction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the mapping sensor moves vertically along a fixed up-and-down direction, then the device structure is simple, but the detection accuracy deteriorates when the substrate array direction inclines relative to the robot
Solution Approach 1:
The mapping course is dynamically adjusted based on the detected arrayed direction of substrates. The control device calculates and sets a mapping course that adapts to the inclination angle between the substrate array and the robot's vertical direction, allowing the mapping sensor to move along an optimized path that maintains consistent spatial relationship with the substrates.
Solution Approach 2:
The system changes the movement parameters of the mapping sensor by calculating a mapping course based on the detected arrayed direction. The mapping course parameters (position, orientation, movement path) are adjusted according to the inclination angle, transforming the fixed vertical movement into an adaptive movement along the substrate array direction.
2Reliability
If the mapping sensor moves along a fixed vertical path, then the control system is simple, but erroneous detection occurs when the substrate array direction is inclined
Solution Approach 1:
The system uses feedback from the detected arrayed direction of substrates to adjust the mapping course. The mapping sensor first detects the arrayed direction of substrates in the container, and this detection result is fed back to the control device, which then calculates and sets an appropriate mapping course based on the detected direction, ensuring reliable substrate state detection.
Solution Approach 2:
The system performs preliminary detection of the arrayed direction before executing the substrate state mapping. By first detecting the inclination and orientation of the substrate array, the system prepares the appropriate mapping course in advance, preventing erroneous detection during the subsequent substrate state mapping process.
3Productivity
If the mapping sensor follows a fixed movement path, then the mapping process is simple and fast, but interference between the substrate and hand occurs when the array direction is inclined
Solution Approach 1:
The mapping course is dynamically determined based on the detected arrayed direction, allowing the mapping sensor to follow an optimized path that avoids interference with substrates. The dynamic adjustment of the mapping course ensures that the sensor moves efficiently along the substrate array direction without causing mechanical interference, maintaining high productivity while preventing harmful interactions.
Data Source
AI summary
A substrate mapping device 4 maps a plurality of substrates 10 inside a container where the substrates 10 are accommodated so as to be arrayed in a given arrayed direction. The substrate mapping device 4 includes a sensor 16 configured to detect a state of the substrate 10, a manipulator 14 configured to move the sensor 16, and a control device 18 configured to control the manipulator 14 to move the sensor 16 along a mapping course. The control device 18 sets a first mapping position and a second mapping position different in the position in the arrayed direction of the substrates 10 from the first mapping position, and sets the mapping course based on the first mapping position and the second mapping position.