Substrate Processing Device Mist Solvent Supply
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Solution Overview
Problem
Conventional substrate processing devices face inefficiencies in attaching solvents to substrates, leading to insufficient replacement of processing liquids, which can result in pattern collapse and inadequate water repellency.
Innovation Solution
A substrate processing device with a solvent supply unit positioned higher than the processing tank opening, supplying mist-like or droplet-like solvents during decompression, and a controlled lifting operation to optimize solvent adhesion, including multiple lifting cycles and standby times to enhance solvent attachment and reduce consumption.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If IPA vapor is discharged into the chamber to replace processing liquid on the substrate, then the substrate can be exposed to solvent atmosphere, but the solvent adhesion to substrate becomes insufficient
Solution Approach 1:
The patent changes the physical state parameter of the solvent from vapor phase to liquid phase (mist-like or droplet-like). By supplying solvent in liquid form instead of vapor form, the solvent can directly adhere to the substrate surface, significantly improving solvent replacement effectiveness and preventing pattern collapse.
Solution Approach 2:
The patent introduces a mist generator as an intermediary device that converts liquid solvent into fine mist-like or droplet-like particles. This intermediary form allows the solvent to be easily dispersed and deposited on the substrate surface, achieving both good coverage and sufficient adhesion without requiring large amounts of solvent.
2Quantity of substance
If the substrate is repeatedly lifted and lowered in the processing liquid, then solvent attachment is enhanced, but processing time increases
Solution Approach 1:
The patent performs preliminary action by supplying mist-like or droplet-like solvent to the processing liquid before substrate lifting operations. This pre-saturation of the processing liquid with solvent ensures that when the substrate is lifted and lowered, solvent is already present in the liquid to adhere to the substrate, reducing the number of lifting cycles needed and thereby reducing processing time.
3Reliability
If more solvent is supplied to ensure adequate coverage, then replacement processing improves, but solvent consumption increases
Solution Approach 1:
The mist generator converts liquid solvent into fine mist-like or droplet-like particles that have large surface area and can be easily dispersed throughout the chamber. This intermediary form allows efficient distribution of solvent with minimal consumption, as the fine particles can reach and adhere to the substrate surface effectively without requiring large volumes of solvent.
Solution Approach 2:
By changing the physical form of solvent delivery from bulk liquid or vapor to fine mist-like or droplet-like particles, the patent achieves more efficient solvent utilization. The modified physical state allows for better penetration and adhesion to the substrate with reduced solvent consumption, while still achieving adequate water repellent processing quality.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The device efficiently attaches solvents to substrates, preventing pattern collapse and ensuring effective water repellency by optimizing solvent adhesion and consumption.
Implementation Method 1
a decompression pump that decompresses an inside of the chamber
Implementation Method 2
supplying at least one of a mist-like solvent and a droplet-like solvent from an outside of the processing tank toward an inside of the processing tank
Data Source
AI summary
A solvent supply unit of a substrate processing device is disposed at a position higher than an opening of an upper surface of a processing tank, and supplies a mist-like solvent from an outside of the processing tank toward an inside of the processing tank in plan view. When a substrate is immersed in processing liquid, a control unit performs a solvent supply operation of decompressing an inside of the chamber and supplying the mist-like solvent from the solvent supply unit. In a solvent supply state in which the inside of the chamber is decompressed and the solvent is supplied, the control unit causes a lifter to take out the substrate from the processing liquid in the processing tank, and then opens a QDR valve to discharge the processing liquid from the processing tank. In the solvent supply state, the control unit causes the lifter to lower the substrate to a lower position in the processing tank in which the processing liquid is not stored, and then causes the lifter to raise the substrate.