Substrate Characteristic Modeling with Adaptive OCD Calibration

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Solution Overview

Problem

Existing optical critical dimension (OCD) metrology methods are inflexible and lack versatility in calibrating substrate characteristics, leading to challenges in accurately capturing complex manufacturing processes due to insufficient or excessive degrees of freedom in model calibration.

Innovation Solution

A system and method that employs a range of calibration techniques, including temporal, frame-wise, multi-model, and hybrid approaches, with regularization, to flexibly adjust the number of fitting parameters, enabling accurate and efficient in-situ monitoring of substrate characteristics during manufacturing processes.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If traditional OCD metrology methods use fixed model calibration approaches, then the calibration process is simple, but the accuracy of substrate characteristic measurement deteriorates due to insufficient flexibility in capturing complex manufacturing processes

Engineering Contradiction:
Improvesubstrate characteristic measurement accuracyVSAvoidmodel calibration complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent implements dynamic model calibration by allowing the system to switch between different calibration approaches (single-time-point, multi-time-point, and temporal calibration engines) based on process complexity. The calibration model adapts its structure and parameters dynamically during substrate processing, enabling accurate capture of time-varying substrate characteristics without requiring a fixed complex model structure.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The system changes calibration parameters including the number of fitting parameters, time-point selections, and model structures based on process requirements. By adjusting these parameters dynamically, the system achieves high measurement accuracy for complex processes while maintaining operational simplicity through automated parameter selection.

Inventive Principle:
Principle #35Parameter changes

2Measurement precision

If the calibration model uses more fitting parameters to capture complex substrate evolution, then the measurement accuracy improves, but the computational complexity and calibration time increase

Engineering Contradiction:
Improvesubstrate characteristic measurement accuracyVSAvoidcalibration time
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The calibration process is segmented into distinct calibration engines operating at different time points during substrate processing. Each calibration engine handles specific calibration tasks for particular time intervals, allowing the system to distribute computational load and reduce overall calibration time while maintaining high measurement accuracy through cumulative calibration results.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The system performs preliminary calibration at initial time points using simplified models, then progressively refines the calibration with additional time-point data as the process evolves. This staged approach allows the system to establish baseline measurements quickly and then improve accuracy incrementally without requiring all calibration computations to be performed simultaneously.

Inventive Principle:
Principle #10Preliminary action

3Adaptability or versatility

If a single calibration approach is used for all substrate processing scenarios, then the system is easy to operate, but the versatility and adaptability to different process complexities deteriorates

Engineering Contradiction:
Improvecalibration method versatilityVSAvoidsystem operation simplicity
Core Design Contradiction:
Adaptability or versatilityVSEase of operation

Solution Approach 1:

The patent implements a universal calibration platform that incorporates multiple calibration engines (single-time-point, multi-time-point, and temporal calibration engines) within a single system. This multi-functional architecture allows the system to adapt to different process complexities and substrate types while maintaining a unified user interface and operational workflow, preserving ease of operation despite enhanced versatility.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The system dynamically selects and switches between different calibration approaches based on the specific substrate processing scenario and process complexity. This dynamic adaptability allows a single system to provide versatile calibration solutions for various applications without requiring manual reconfiguration, maintaining operational simplicity while achieving high adaptability.

Inventive Principle:
Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enhances the accuracy and versatility of in-situ OCD inference by allowing for customizable model selection based on process complexity, providing precise and timely insights into substrate evolution, thereby improving manufacturing efficiency and product quality.

Implementation Method 1

The emitted light interacts with the substrate, and its reflected or diffracted light is directed to a sensor where its properties are measured and recorded

Methodology Applied
Scientific EffectReflection: Reflection

Implementation Method 2

The emitted light interacts with the substrate, and its reflected or diffracted light is directed to a sensor where its properties are measured and recorded

Methodology Applied
Scientific EffectDiffraction: Diffraction

Data Source

PatentUS20250271779A1Modeling substrate characteristics from manufacturing sensor data
Publication Date: 2025.08.28 APPLIED MATERIALS INC
  • US20250271779A1 patent drawing
  • US20250271779A1 patent drawing
  • US20250271779A1 patent drawing

AI summary

A method for estimating process characteristics is provided. The method can include collecting process data from a spectral emitter and a spectral sensor during a substrate processing operation, and generating a calibrated model for the process data. Generating a calibrated model can include selecting a calibration option from a set of calibration options, based on a degree of freedom associated with a given calibration option, and calibrating a base model to generate the calibrated model. The base model is calibrated using the selected calibration option and a portion of the first process data.