Substrate Processing Nozzle Decompression Release Fine Bubble Generation
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Solution Overview
Problem
Existing substrate processing systems face challenges in supplying highly concentrated fine bubbles to substrates without generating large sized bubbles in the processing liquid supply line, which obstructs the flow and limits the concentration of dissolved gases.
Innovation Solution
A substrate processing system comprising a gas dissolved water generation tank, a chemical liquid dilution module, and a processing liquid supply nozzle with a decompression release portion that generates fine bubbles by reducing the pressure of the diluted chemical liquid, ensuring that highly concentrated fine bubbles are supplied directly to the substrate during processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If gas is dissolved in cleaning liquid by pressurizing through a membrane to generate highly concentrated nanobubbles, then the cleaning effectiveness is improved, but large sized bubbles are generated as excess gas component which obstructs the flow of cleaning liquid in the supply line
Solution Approach 1:
The invention segments the bubble generation process from the supply line by using a decompression release portion located at the nozzle tip. This separates the function of dissolving gas (in the tank) from the function of generating fine bubbles (at the nozzle), preventing large bubble formation in the supply line while maintaining high gas concentration capability.
Solution Approach 2:
The invention performs preliminary gas dissolution in the cleaning liquid before supply by equipping the storage tank with a gas dissolution section that pressurizes gas through a membrane. This preliminary action allows the liquid to be saturated with gas at high concentration before reaching the decompression point, ensuring high fine bubble concentration without generating large bubbles in transit.
2Ease of operation
If a filter is added in the supply line to remove large sized bubbles, then the flow obstruction is reduced, but the device complexity increases
Solution Approach 1:
The invention extracts the harmful function of large bubble generation from the supply line by relocating the bubble generation mechanism to the nozzle tip decompression release portion. This eliminates the need for filters or other bubble removal devices in the supply line, maintaining flow smoothness while simplifying the overall system structure.
Solution Approach 2:
The invention changes the pressure parameter along the supply line, maintaining high pressure in the storage tank and supply line to prevent large bubble formation, then applying decompression only at the nozzle tip. This parameter control approach ensures fine bubble generation occurs only where needed, eliminating flow obstruction issues without adding complex filtration systems.
3Quantity of substance
If pressure of cleaning liquid is reduced below a certain value to dissolve gas through membrane, then gas dissolution is improved, but the saturation concentration of gas decreases
Solution Approach 1:
The invention performs preliminary gas dissolution at high pressure in the storage tank before supply, allowing the cleaning liquid to become saturated with gas at high concentration. The decompression and fine bubble generation occur later at the nozzle tip, separating the dissolution phase (high pressure) from the release phase (low pressure), thus resolving the contradiction between pressure requirements for dissolution versus saturation concentration.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively prevents the formation of large bubbles in the supply line, allowing for the efficient delivery of highly concentrated fine bubbles to the substrate, enhancing the cleaning and polishing processes by maintaining high bubble concentration and flow efficiency.
Implementation Method 1
The gas dissolution section dissolves a gas in the cleaning liquid by pressurizing the gas through a membrane, for example, to the cleaning liquid flowing in the supply line. At this time, it is possible to generate nanobubbles in the cleaning liquid by allowing the cleaning liquid to contain the gas to a supersaturated state.
Implementation Method 2
the processing liquid supply nozzle has a decompression release portion that generates fine bubbles of the gas from a diluted chemical liquid by decompressing the diluted chemical liquid mixed in the chemical liquid dilution module from the first pressure to a second pressure
Data Source
AI summary
A substrate processing system capable of supplying a processing liquid containing fine bubbles at a high concentration without generating large sized bubbles in a middle of a supply line of the processing liquid is disclosed. There is provided a substrate processing system comprising: a gas dissolved water generation tank; a chemical liquid dilution module; and a substrate processing module. The substrate processing module comprises a processing liquid supply nozzle configured to supply the processing liquid onto a substrate. The processing liquid supply nozzle has a decompression release portion configured to generate fine bubbles of a gas from a diluted chemical liquid. The processing liquid supply nozzle is configured to supply the diluted chemical liquid containing fine bubbles in a process scrubbing the substrate.