Unified Exhaust Flow Path for Substrate Processing Nozzle
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Solution Overview
Problem
Existing substrate processing apparatuses face difficulties in controlling the overall exhaust amount due to separate management of gas exhaust from processing chambers and waiting pods, leading to inefficient gas regulation.
Innovation Solution
A substrate processing apparatus is designed with a nozzle that supplies processing liquid to a substrate, a mover to move the nozzle between supply and waiting positions, a nozzle container, a first exhaust flow path guiding gas from the processing space to an exhaust device, and a second exhaust flow path guiding gas from the nozzle container to the first exhaust flow path, allowing for unified exhaust control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If separate exhaust flow paths are provided for processing chamber and waiting pod, then gas exhaust from each space is managed independently, but overall exhaust amount control becomes difficult
Solution Approach 1:
The patent merges the exhaust flow paths by making the second exhaust flow path (from waiting pod) communicate with the first exhaust flow path (from processing chamber). This allows both exhaust streams to be combined into a single unified exhaust system, enabling centralized control of overall exhaust amount while maintaining the ability to independently manage each space's exhaust through valves or flow controllers positioned at different locations in the system.
2Ease of operation
If multiple exhaust devices are used for separate exhaust flow paths, then each space has dedicated exhaust control, but device complexity and cost increase
Solution Approach 1:
The patent combines multiple exhaust streams into a single exhaust device by configuring the second exhaust flow path to communicate with the first exhaust flow path. This reduces the number of exhaust devices from multiple independent units to a single unified exhaust system, thereby reducing device complexity and cost while maintaining operational control through flow regulation mechanisms positioned at strategic points in the combined system.
3Ease of operation
If separate exhaust management is implemented, then each space can be controlled independently, but overall exhaust regulation efficiency decreases
Solution Approach 1:
The patent merges exhaust flow paths to enable centralized regulation of overall exhaust amount while maintaining independent control capabilities. By combining the exhaust streams into a unified system with strategic placement of flow controllers, the system achieves both independent space control and efficient overall exhaust regulation, improving productivity by reducing the time and complexity involved in managing multiple separate exhaust systems.
Data Source
AI summary
A substrate processing apparatus includes a nozzle that supplies a processing liquid to a substrate, a mover that moves the nozzle between a supply position above a substrate and a waiting position outward of the substrate, a nozzle container that is located at the waiting position and contains the nozzle, a first exhaust flow path that guides a gas in a processing space in which a processing liquid is supplied to a substrate to an exhaust device, and a second exhaust flow path that guides a gas in the nozzle container to the first exhaust flow path.