Substrate Processing Nozzle Gas Extrusion Method
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Solution Overview
Problem
Existing substrate processing methods using nitrogen gas to remove processing liquids from nozzles and pipes can damage substrates by blowing gas directly onto them, leading to reduced processing quality and contamination.
Innovation Solution
A method and apparatus that introduce gas into the processing liquid pipe after stopping liquid discharge, allowing the liquid to act as a seal until completely removed, preventing gas from being blown onto the substrate and reducing liquid dripping, while also collecting the remaining liquid for reuse.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of substance
If nitrogen gas is introduced into the processing liquid pipe to extrude and discharge the processing liquid, then the processing liquid is completely removed from the processing liquid nozzle and pipe, but the gas is directly blown onto the substrate causing damage and quality degradation
Solution Approach 1:
The patent introduces a nitrogen gas barrier layer between the gas flow and the substrate. This barrier layer acts as an intermediary that prevents the nitrogen gas from directly contacting and damaging the substrate while still allowing the gas to extrude the processing liquid from the pipe and nozzle
Solution Approach 2:
The patent performs preliminary action by forming the nitrogen gas barrier layer before the gas extrusion process begins. The barrier layer is created by introducing nitrogen gas at a controlled rate to form a protective layer on the substrate surface before the main extrusion flow occurs
2Loss of substance
If gas is continuously introduced to completely remove processing liquid from the pipe, then no processing liquid remains in the nozzle, but the gas flow directly contacts and dries the substrate center portion causing non-uniformity
Solution Approach 1:
The nitrogen gas barrier layer serves as a mediator that allows complete processing liquid removal while preventing direct gas-substrate contact. The barrier layer is maintained throughout the extrusion process to ensure both complete discharge and substrate protection
Solution Approach 2:
The patent controls the nitrogen gas introduction rate as a parameter to maintain an optimal barrier layer thickness. By adjusting the gas flow rate, the system achieves complete liquid removal while the barrier layer prevents substrate drying and maintains processing uniformity
3Object-affected harmful factors
If the gas introduction is stopped before complete liquid removal, then the substrate is protected from gas blowing, but processing liquid remains in the pipe and nozzle causing dripping
Solution Approach 1:
The nitrogen gas barrier layer enables the system to stop gas introduction at the optimal moment when the substrate is protected but liquid removal is nearly complete. The barrier layer ensures that even if small amounts of liquid remain, they can be safely removed without substrate damage
4Object-generated harmful factors
If processing liquid is completely removed from the pipe and nozzle, then no dripping occurs, but expensive processing liquid is wasted
Solution Approach 1:
The nitrogen gas barrier layer allows the system to leave small amounts of processing liquid in the nozzle and pipe without causing dripping. The barrier layer prevents direct contact between the residual liquid and substrate, enabling cost-effective liquid retention
Solution Approach 2:
The patent enables recovery of expensive processing liquid by stopping extrusion when most liquid is removed but a small protective amount remains. This residual liquid can be recovered and reused, reducing overall consumption while the barrier layer prevents dripping
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents substrate damage by ensuring gas is not blown onto the substrate during the extrusion process, maintains processing quality, and reduces operational costs by reusing expensive chemicals.
Implementation Method 1
nitrogen is introduced into a processing liquid pipe through a mixing valve. By the nitrogen introduced into the processing liquid pipe, the processing liquid present within the processing liquid nozzle and within the processing liquid pipe is extruded and is discharged from the processing liquid nozzle
Data Source
AI summary
The method includes holding a substrate horizontally with a holding and rotating mechanism; introducing processing liquid from a fluid introduction portion of, in a processing liquid pipe in which a processing liquid nozzle having a discharge port at a tip end is provided at one end, the other end of the processing liquid pipe into the processing liquid pipe so as to discharge the processing liquid from the discharge port toward the substrate; introducing, after stopping the processing liquid discharge step, a gas from the fluid introduction portion into the processing liquid pipe so as to extrude the processing liquid within the processing liquid pipe and within the processing liquid nozzle outwardly; and stopping, after starting the introduction of the gas, the introduction of the gas into the processing liquid pipe with the processing liquid being left within the processing liquid pipe and/or the processing liquid nozzle.