Substrate Nozzle Switching That Maintains Edge Liquid Film Coverage
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Solution Overview
Problem
Existing substrate processing apparatuses face issues where the outer peripheral portion of a substrate becomes uncovered with a liquid film during liquid switching, leading to potential pattern collapse in subsequent steps, affecting yield.
Innovation Solution
The apparatus includes a nozzle, substrate holding portion, liquid receiving portion, drainage mechanism, and nozzle moving portion, with controlled liquid supply and drainage mechanisms to ensure continuous liquid coverage during transitions, using a controlling portion to delay supply stops and allow simultaneous discharge of multiple liquids.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If the discharge of the first chemical liquid is stopped and the first scan nozzle is moved to the first standby position before discharging the rinse liquid, then the nozzle can be repositioned for the next liquid type, but the outer peripheral portion of the substrate is not covered with a liquid film, leading to pattern collapse
Solution Approach 1:
The nozzle moves to the standby position in advance before the liquid discharge is completely stopped. This preliminary repositioning allows the nozzle to be ready for the next liquid type while maintaining continuous liquid film coverage on the substrate during the transition period.
Solution Approach 2:
The liquid discharge continues even after the nozzle has moved to the standby position, ensuring continuous liquid film coverage on the substrate. This overlapping period maintains the useful action of liquid application while enabling nozzle repositioning.
2Productivity
If the rinse liquid is discharged after stopping the first chemical liquid and moving the nozzle to standby position, then the liquid switching is completed, but the outer peripheral portion of the substrate remains uncovered with liquid film
Solution Approach 1:
The nozzle moves to the standby position before the liquid discharge is stopped, allowing the liquid switching to be initiated in advance. This ensures that the liquid film coverage is maintained on the substrate throughout the switching process.
Solution Approach 2:
The system dynamically adjusts the timing of nozzle movement and liquid discharge stop. The nozzle position and liquid discharge are coordinated such that the liquid film coverage is maintained during the transition, balancing switching speed with film uniformity.
3Adaptability or versatility
If multiple scan nozzles are used for different chemical liquids, then various liquids can be supplied in sequence, but the liquid switching process causes gaps in liquid film coverage at the outer peripheral portion
Solution Approach 1:
Each scan nozzle moves to its standby position in advance before its liquid discharge is stopped. This preliminary action ensures that the nozzle is repositioned while maintaining liquid film coverage, preventing gaps during the switching between different chemical liquids.
Solution Approach 2:
The liquid discharge continues during the nozzle repositioning period, maintaining continuous liquid film coverage on the substrate. This ensures that the useful action of liquid application is not interrupted during the switching between different chemical liquids.
Data Source
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AI summary
A substrate processing apparatus (100) includes a nozzle (3), a substrate holding portion (2), a liquid receiving portion (11), a drainage mechanism (6), and a nozzle moving portion (5). The nozzle (3) selectively discharges a plurality of types of processing liquids including an acid chemical liquid, an alkaline chemical liquid, and a rinse liquid. The substrate holding portion (2) holds a substrate (W). The liquid receiving portion (11) is located outside the substrate holding portion (2) and receives the processing liquid discharged from the nozzle (3). The drainage mechanism (6) guides the acid chemical liquid discharged from the liquid receiving portion (11) to a first drainage piping (DP1) and guides the alkaline chemical liquid discharged from the liquid receiving portion (11) to a second drainage piping (DP2). The nozzle moving portion (5) moves the nozzle (3) between a processing position (PS1) opposing the substrate (W) held by the substrate holding portion (2) and a standby position (PS2) opposing the liquid receiving portion (11).