Substrate Processing Apparatus Oxygen Removal via Inert Gas Sparging
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Solution Overview
Problem
Existing substrate processing methods face challenges in efficiently removing oxygen dissolved in chemical liquids, which can form oxide films on substrates, leading to reduced cleaning efficiency and reliability, especially when using strongly acidic chemicals like hydrogen fluoride.
Innovation Solution
A substrate processing apparatus and method that incorporates an inert-gas supply system to mix with the chemical liquid, generating a gas-liquid mixture that reduces oxygen levels, using an ejector to circulate the chemical liquid and introduce the mixture back into the storage container, thereby reducing oxygen dissolved in the chemical liquid before processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If oxygen is dissolved in chemical liquid, then the chemical liquid can be stored and circulated, but oxide films form on substrate surfaces reducing cleaning efficiency
Solution Approach 1:
The patent applies preliminary action by removing oxygen from the chemical liquid before it is supplied to the substrate processing chamber. The inert gas is introduced into the chemical liquid while it is being stored and circulated in the storing container, pre-reducing the oxygen content before the chemical liquid contacts the substrate. This preliminary oxygen removal prevents oxide film formation during the actual substrate processing, thereby maintaining high cleaning efficiency
Solution Approach 2:
The patent changes the physical and chemical parameters of the chemical liquid by introducing inert gas bubbles that alter the gas-liquid interface characteristics. The bubbling action increases the surface area for gas-liquid contact and changes the partial pressure of oxygen at the interface, facilitating oxygen transfer from liquid to gas phase. This parameter change approach enables continuous oxygen removal while maintaining the chemical liquid's etching capability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances processing efficiency and reliability by effectively reducing oxygen in chemical liquids, preventing oxide film formation and extending apparatus lifespan while reducing costs by eliminating the need for vacuum pumps.
Implementation Method 1
mixing a chemical liquid and an inert gas in a mixture generating part by supplying the chemical liquid from the chemical-liquid storing container into the mixture generating part, and by supplying the inert gas from the inert-gas supply source into the mixture generating part, so as to generate a gas-liquid mixture
Implementation Method 2
the mixture generating part is formed of an ejector configured to suck the chemical liquid from the chemical-liquid storing container, due to a flow of the supplied inert gas, and to mix the chemical liquid and the inert gas with each other
Data Source
AI summary
A substrate processing apparatus according to the present invention comprises: a processing part configured to process a substrate; a chemical-liquid storing container configured to store a chemical liquid; a chemical-liquid supply driving part configured to supply the chemical liquid from the chemical-liquid storing container into the processing part; a circulation line configured to circulate the chemical liquid stored in the chemical-liquid storing container; and a mixture generating part provided on the circulation line. An inert-gas supply source is configured to supply an inert gas into the mixture generating part. The mixture generating part is configured to mix the chemical liquid supplied from the chemical-liquid storing container and the inert gas supplied from the inert-gas supply source with each other so as to generate a gas-liquid mixture.