Substrate Processing Control via Partial Recipe Segmentation
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Solution Overview
Problem
Current substrate processing apparatuses require significant operator effort and risk of error when setting and changing process recipes, especially when hardware configurations change, as each process recipe must be updated individually, making it difficult to manage varying process conditions across multiple processes.
Innovation Solution
A substrate processing apparatus with a control part that links processing procedures into partial recipes, allowing for easy management and modification of process recipes by dividing procedures into functions, reducing the need for extensive operator input and minimizing errors.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If all processing procedures (preceding process, substrate processing process, and post-process) are set in a single recipe, then the processing procedure can be controlled in a unified manner, but the operator workload increases and errors are more likely to occur when inputting or changing settings
Solution Approach 1:
The patent divides a single comprehensive recipe into multiple partial recipes, each handling specific processing procedures (preceding process, substrate processing process, post-process). This segmentation allows operators to work with smaller, more manageable recipe units, reducing input errors and workload while maintaining unified control through the control unit that executes sequences of these partial recipes.
2Adaptability or versatility
If apparatus parameters are applied uniformly to all substrate processes, then a single parameter change reflects across all processes, but it becomes difficult to set different process conditions for different processes
Solution Approach 1:
The patent enables different process conditions to be set for different processes by allowing each partial recipe to have its own specific parameter settings. The control unit selects and executes appropriate partial recipes based on the specific substrate processing requirements, enabling local optimization of process conditions for each process type while maintaining overall system coordination.
Data Source
AI summary
A substrate processing apparatus is provided that includes a control part configured to control a substrate process in accordance with a processing procedure set in a process recipe. The process recipe is linked to a plurality of partial recipes obtained by dividing the processing procedure into functions. The control part controls the substrate process in accordance with processing procedures set in the linked plurality of partial recipes.