Substrate Processing Chamber Partition for Odor Leakage Control
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Solution Overview
Problem
Existing substrate processing apparatuses face challenges in maintaining a comfortable working environment due to the leakage of processing liquids with strong odors, as they struggle to effectively manage pressure differences between processing and non-processing spaces, leading to odor leakage.
Innovation Solution
A substrate processing apparatus with a chamber partitioned into processing and non-processing spaces using a partition plate and cylindrical member, where the partition plate has through holes to guide airflow and a nozzle opening covered by a lid to reduce odor leakage, and an exhauster to control pressure, ensuring the processing space pressure is lower than the non-processing space.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If the processing space is completely sealed to prevent odor leakage, then odor containment is improved, but processing liquid supply to the substrate is hindered
Solution Approach 1:
The partition plate is segmented with multiple types of openings: through holes for airflow control, nozzle openings for liquid supply, and gaps for substrate access. This segmentation allows different regions of the partition plate to serve different functions - odor containment while permitting necessary material flow
Solution Approach 2:
Different regions of the partition plate have different properties: the first wall portion has through holes for airflow, the second wall portion has nozzle openings for liquid supply, and the third wall portion has gaps for substrate access. Each region is optimized for its specific function while contributing to overall odor containment
2Object-affected harmful factors
If pressure in processing space is reduced to suppress odor leakage, then odor containment is improved, but airflow control complexity increases
Solution Approach 1:
The partition plate structure itself performs the airflow control function through its built-in through holes and pressure equalization features. The plate automatically balances pressure between spaces while maintaining downward airflow, eliminating the need for external active pressure control mechanisms
Solution Approach 2:
The partition plate changes the pressure parameter distribution within the chamber by creating controlled pressure gradients. The through holes and gaps allow pressure equalization while maintaining the pressure differential needed for downward airflow and odor containment
3Object-affected harmful factors
If a partition structure is added to divide processing and non-processing spaces, then odor containment is improved, but device complexity increases
Solution Approach 1:
The partition plate performs multiple functions simultaneously: it divides the chamber into processing and non-processing spaces, controls airflow through through holes, supplies processing liquid through nozzle openings, and allows substrate access through gaps. This multi-functionality reduces the need for separate components for each function
Solution Approach 2:
The partition plate merges several functional elements into a single integrated component: partitioning walls, airflow control holes, nozzle mounting structures, and substrate access gaps are all combined in one plate, simplifying the overall device structure
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively suppresses odor leakage, maintaining a comfortable working environment by ensuring the processing space pressure is lower than the non-processing space pressure, reducing the likelihood of odor escape and preventing interference between nozzle and lid components.
Implementation Method 1
an airflow former that supplies gas into the chamber to form a downward airflow
Implementation Method 2
a container provided at a position below the nozzle cover so as to be spaced apart from the nozzle cover and containing a lower portion of the substrate holder, and including an exhauster that exhausts an atmosphere in the casing to the outside of the casing
Implementation Method 3
a partition plate that is provided at a position above the processing cup, and has a plurality of through holes for guiding part of the downward airflow to the processing space
Data Source
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AI summary
A development device includes a casing, an airflow former and a substrate holding device. The airflow former forms a downward flow of clean air in the inner space of the casing. The development device further includes a plurality of nozzles and a partition mechanism. The plurality of nozzles supply a processing liquid to a substrate held by the substrate holding device. The partition mechanism partitions the inner space of the casing into a processing space and a non-processing space with a substrate held by the substrate holding device. The processing space is a space including a substrate held by the substrate holding device. The partition mechanism includes a cup that receives a processing liquid that splashes from a substrate, a partition plate that has a nozzle opening and a plurality of through holes and is provided above the cup and a cover member that covers the nozzle opening.