Substrate Transfer Path Feedback for Defect-Aware Unit Selection
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Solution Overview
Problem
In semiconductor manufacturing, the photolithography process faces inefficiencies in substrate treatment due to the lack of intelligent path selection and defect measurement feedback, leading to suboptimal use of process units and potential defects in substrate processing.
Innovation Solution
A substrate treating apparatus and method that includes a scheduler, storage, and selection module to simulate and store transfer paths, measure defect values, and apply weighting values to process units, enabling the selection of the highest priority process unit based on defect data for improved process efficiency and defect reduction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If the earliest accessed unit and module are selected for substrate transfer, then all units can be equally used, but process results are not optimized due to lack of defect-based feedback
Solution Approach 1:
The patent implements a feedback mechanism where defect values measured from substrates are stored and used to influence subsequent process decisions. The system measures defects, stores the data, and uses this information to adjust unit selection for future substrates, creating a closed-loop system that continuously improves process results based on actual performance data.
Solution Approach 2:
The system changes the selection criterion from simple chronological order (earliest accessed) to a defect-based priority system. By introducing defect values as a new parameter and using them to dynamically adjust unit selection priorities, the system optimizes process results while maintaining unit utilization.
2Manufacturing precision
If defect measurement and feedback systems are implemented, then process results are optimized, but device complexity increases
Solution Approach 1:
The system is divided into distinct functional modules: a measuring instrument for defect detection, a storage unit for data retention, and a control system for decision-making. This segmentation allows each component to perform its specific function independently, making the complex system more manageable and maintainable.
Solution Approach 2:
The storage unit acts as an intermediary between the measuring instrument and the control system. It buffers and organizes defect data, allowing the control system to make informed decisions without direct real-time connection to the measurement process, thereby reducing system complexity.
3Ease of operation
If manual path selection is used, then system operation is simple, but productivity is reduced due to suboptimal unit selection
Solution Approach 1:
The system performs automatic unit selection based on stored defect data, eliminating the need for manual path selection. The control system autonomously determines the optimal unit by retrieving defect values and applying selection criteria, thereby maintaining operational simplicity while significantly improving productivity through intelligent automation.
Solution Approach 2:
Defect measurements are taken and stored in advance before the substrate processing decision is made. This preliminary action allows the system to have complete information available when selecting the next process unit, enabling optimal decisions without adding complexity to the real-time operation.
Data Source
AI summary
A substrate treating apparatus includes a process module including a plurality of process units that perform a plurality of steps included in a substrate treating process and that perform the substrate treating process on substrates sequentially placed in the process units based on process recipes for the substrates, a scheduler that controls operations of the process module and the process units included in the process module, a storage that stores transfer paths information of the substrates, and a selection module that selects a process unit to proceed, by a result of feeding back the transfer paths information stored in the storage to the scheduler. The substrate treating apparatus may further include a measuring instrument that measures defect values of the transfer paths information along which the substrates are transferred. The storage may store the defect values measured by the measuring instrument according to the transfer paths information of the substrates.