Substrate Pattern Drying Using a Sublimable Solid-State Stiffener

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Existing substrate drying methods face challenges in preventing pattern collapse of uneven patterns during the drying process, particularly due to the transition from a liquid to a gas state, which can cause surface tension issues.

Innovation Solution

A substrate processing method that replaces the liquid in recesses of an uneven pattern with a solid-state stiffener and subjects it to molecular weight reduction processing, reducing intermolecular bonds while maintaining the stiffener in a solid state, thereby preventing pattern collapse by facilitating a transition from liquid to solid to gas without the intermediate liquid phase.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If a liquid is used to fill recesses of an uneven pattern during drying, then the liquid can be easily applied and removed, but pattern collapse occurs due to surface tension during the liquid-to-gas transition

Engineering Contradiction:
Improveease of liquid applicationVSAvoidpattern collapse
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent changes the physical state parameter of the filling material from liquid to solid. By using a solid-state stiffener instead of liquid, the material maintains structural support without exhibiting surface tension effects that cause pattern collapse during drying. The solid stiffener can be subsequently removed through sublimation without passing through a liquid phase.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent utilizes a phase transition approach by selecting a solid-state material that can directly sublime from solid to gas phase. This bypasses the problematic liquid phase that causes surface tension and pattern collapse, enabling easy removal of the stiffener while maintaining pattern integrity throughout the process.

Inventive Principle:
Principle #36Phase transitions

2Manufacturing precision

If a solid-state stiffener is used to prevent pattern collapse, then pattern integrity is maintained, but the stiffener must be removed without causing damage to the underlying pattern

Engineering Contradiction:
Improvepattern integrityVSAvoiddamage during stiffener removal
Core Design Contradiction:
Manufacturing precisionVSObject-affected harmful factors

Solution Approach 1:

The patent employs phase transition by utilizing the sublimation property of the solid-state stiffener material. The stiffener is designed to transition directly from solid to gas phase under controlled conditions, enabling complete removal without leaving residues or causing mechanical damage to the delicate underlying pattern.

Inventive Principle:
Principle #36Phase transitions

Solution Approach 2:

The patent converts the potential harm of having a solid material that needs removal into a benefit by selecting a material with sublimation properties. The very property that makes the material solid and structurally supportive also enables its clean removal through phase transition, turning a potential problem into a solution.

Inventive Principle:
Principle #22Blessing in disguise (Convert harm into benefit)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method effectively prevents pattern collapse by ensuring the stiffener is more susceptible to sublimation than the pattern itself, allowing for reliable removal of the stiffener while maintaining the pattern integrity, thus enhancing the stability and accuracy of the substrate processing.

Implementation Method 1

subjecting the substrate to a molecular weight reduction processing that reduces the number of intermolecular bonds contained in the stiffener while maintaining the stiffener in a solid state

Methodology Applied
Scientific EffectMolecular weight reduction:

Implementation Method 2

facilitating a transition from liquid to solid to gas without the intermediate liquid phase

Methodology Applied
Scientific EffectSublimation: Sublimation

Data Source

PatentUS20240038533A1Substrate processing method and substrate processing apparatus
Publication Date: 2024.02.01 TOKYO ELECTRON LTD
  • US20240038533A1 patent drawing
  • US20240038533A1 patent drawing
  • US20240038533A1 patent drawing

AI summary

The present disclosure provides a substrate processing method and a substrate processing apparatus which are effective in preventing pattern collapse of an uneven pattern. The substrate processing method according to an exemplary embodiment includes replacing a liquid in a recess of a substrate having an uneven pattern of a negative type resist including a metal formed on a surface of the substrate with a solid-state stiffener, and subjecting the substrate to a molecular weight reduction processing that reduces the number of intermolecular bonds contained in the solid-state stiffener while maintaining the solid-state stiffener in a solid state.