Substrate Supporting Plate Edge Anodization for Rear-Side Gas Sealing
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Solution Overview
Problem
During semiconductor thin film deposition, residual gases can contaminate the substrate and reactor, leading to device malfunction due to unwanted deposition on the rear surface of the substrate and diffusion of contaminants in the reactive space.
Innovation Solution
A substrate supporting plate with an anodized edge portion and a central non-anodized portion is used, featuring an insulating layer on the top surface, which prevents source and reactive gases from reaching the rear surface of the substrate, ensuring effective face sealing and easy substrate unloading.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If the substrate mounting portion is entirely anodized to prevent gas penetration, then contamination prevention is improved, but substrate unloading difficulty increases due to strong adhesion
Solution Approach 1:
The substrate mounting portion is divided into two regions with different anodization states: an edge portion that is anodized to prevent gas penetration and contamination, and a central portion that remains non-anodized to reduce adhesion strength and facilitate substrate unloading. This segmentation allows each region to perform its specific function optimally.
Solution Approach 2:
Different surface properties are applied to different locations of the substrate mounting portion. The edge portion has high adhesion (anodized) to seal against gas penetration, while the central portion has low adhesion (non-anodized) to enable easy substrate release. This local differentiation of surface quality resolves the contradiction between contamination prevention and ease of unloading.
2Ease of operation
If the substrate mounting portion is not anodized to facilitate substrate unloading, then ease of operation is improved, but gas penetration and contamination increase
Solution Approach 1:
The substrate mounting portion is segmented into an anodized edge portion for gas sealing and a non-anodized central portion for easy unloading. This segmentation ensures that the gas barrier function is maintained at the perimeter while the central area allows for simple substrate release.
Solution Approach 2:
The edge portion is anodized to provide high adhesion and gas tightness, while the central portion remains non-anodized to provide low adhesion for easy substrate removal. This local quality differentiation prevents gas penetration at the edges while facilitating unloading from the center.
3Object-affected harmful factors
If the entire substrate supporting plate is anodized to prevent contamination, then contamination prevention is improved, but manufacturing complexity increases
Solution Approach 1:
The anodization process is segmented to treat only the edge portion of the substrate mounting portion rather than the entire plate. This partial anodization reduces manufacturing complexity compared to full anodization while still providing adequate contamination prevention at the critical perimeter regions.
Solution Approach 2:
Instead of uniformly anodizing the entire substrate supporting plate, only the edge portion receives the anodized coating. This localized treatment reduces material consumption, processing time, and manufacturing complexity while maintaining effective contamination prevention where it is most needed.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution prevents contamination and ensures high-quality thin film deposition by minimizing gas penetration to the rear surface, facilitating easy substrate unloading and reducing reactor contamination.
Implementation Method 1
an edge portion of a top surface of the substrate mounting portion is anodized
Implementation Method 2
The anodized edge portion may have a thickness ranging from about 10 μm to about 100 μm. An insulating layer may be formed on a top surface of the edge portion due to the anodizing. The insulating layer may include aluminum oxide.
Data Source
AI summary
A substrate supporting plate that provides improved processing uniformity is disclosed. The substrate supporting plate may include a substrate mounting portion and a peripheral portion surrounding the substrate mounting portion. A portion of the peripheral portion may include an insulating layer. A central portion of the top surface may not include the insulating layer.


