Substrate Posture Switching for Uniform Wet Treatment
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Solution Overview
Problem
Existing substrate treating methods face challenges in achieving high mass productivity, uniform treatment quality, minimizing pattern leaning and water mark generation, especially for substrates with high aspect ratio patterns, in both batch and single-type treatments.
Innovation Solution
A substrate treating apparatus and method that includes a treating bath with a support member for vertical substrates and a posture changing robot to switch to horizontal posture, combined with a liquid supply member that uses nozzles with varying spray distances and flow rates to efficiently treat substrates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If batch-type treating method is used to improve mass productivity, then productivity increases, but pattern leaning phenomenon occurs on high aspect ratio patterns
Solution Approach 1:
The batch-type treating process is segmented into two distinct stages: (1) vertical immersion treatment for bulk processing, and (2) horizontal posture treatment for precision finishing. This segmentation allows each stage to optimize for its specific function, resolving the contradiction between productivity and precision.
Solution Approach 2:
The substrate posture is dynamically changed from vertical to horizontal during the treating process. The posture changing robot enables this dynamic transition, allowing the substrate to be treated in vertical position for efficiency, then repositioned horizontally to prevent pattern leaning on high aspect ratio structures.
2Productivity
If batch-type treating method is used to improve mass productivity, then productivity increases, but water mark generation occurs on exposed substrates
Solution Approach 1:
A preliminary action is taken by changing the substrate posture to horizontal and supplying wetting liquid before the substrates are exposed to air. This preliminary wetting prevents water marks by ensuring continuous liquid coverage during the transition and exposure phases.
Solution Approach 2:
Wetting liquid is introduced as an intermediary substance during the posture change and air exposure phases. This intermediary liquid layer prevents direct contact between air and the substrate surface, eliminating water mark formation while maintaining the benefits of batch processing.
3Manufacturing precision
If single-type treating method is used to reduce pattern leaning, then manufacturing precision improves, but mass productivity deteriorates
Solution Approach 1:
The single-type treating method is merged with batch processing capabilities. The system combines the horizontal posture treatment (which prevents pattern leaning) with batch-type substrate handling, allowing multiple substrates to be treated simultaneously in horizontal position, thus achieving both precision and productivity.
Solution Approach 2:
The treating apparatus is designed with multi-functionality, capable of handling substrates in both vertical and horizontal postures, and switching between batch and single-type processing modes. This universality allows the system to achieve high productivity through batch processing while maintaining precision through horizontal posture treatment.
4Productivity
If spin-drying is used to improve drying efficiency, then productivity increases, but pattern leaning occurs on high aspect ratio patterns
Solution Approach 1:
The drying process is made dynamic by changing the substrate posture from horizontal to vertical during the drying sequence. Substrates are dried in vertical posture using downward airflow, which prevents pattern leaning while maintaining high drying efficiency, eliminating the need for spin-drying.
Solution Approach 2:
The mechanical spin-drying system is replaced with a airflow-based drying system. Instead of using centrifugal force from rotation, the system uses controlled airflow in vertical posture to achieve drying, thereby preventing pattern leaning while maintaining productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances mass productivity, improves treatment uniformity, reduces pattern leaning and water mark risks, and effectively handles substrates with high aspect ratio patterns.
Implementation Method 1
a liquid supply member configured to supply a wetting liquid to the substrate placed on the body
Data Source
AI summary
The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a treating bath having an accommodation space for accommodating a treating liquid; a support member configured to support at least one substrate in a vertical posture at the accommodation space; and a posture changing robot configured to change a posture of a substrate immersed in the treating liquid from the vertical posture to a horizontal posture, and wherein the posture changing robot comprises: a body configured to hold the substrate thereon; and a liquid supply member configured to supply a wetting liquid to the substrate placed on the body.