Substrate Posture Turning Mechanism for Batch-to-Single Wafer Transfer
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing substrate treating apparatuses face challenges in enabling easy access for single-wafer substrate transport mechanisms to receive substrates from batch substrate transport mechanisms, particularly when the substrates need to be turned from a vertical to a horizontal posture.
Innovation Solution
A substrate treating apparatus is designed with a posture turning mechanism that includes a substrate holder accessible by a batch substrate transport mechanism, a posture turning unit accessible by a single-wafer substrate transport mechanism, and a second batch substrate transport mechanism to facilitate direct transfer of substrates from vertical to horizontal posture, using chucks and guide grooves to prevent substrate damage and enable easy access.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the rotating mechanism receives substrates from a vertical substrate transporting robot at a position far apart from the horizontal substrate transporting robot, then the batch processing capacity is maintained, but the single-wafer substrate transporting robot cannot easily access the substrates in horizontal posture
Solution Approach 1:
A second batch substrate transporting robot is introduced as an intermediary to transfer substrates from the first batch substrate transporting robot to the posture turning unit. This mediator resolves the spatial separation issue, allowing the first robot to maintain batch processing at a distance while enabling efficient substrate transfer to the posture turning unit for subsequent access by the single-wafer substrate transporting robot
Solution Approach 2:
The substrate transport function is divided into multiple segments: the first batch substrate transporting robot handles bulk substrate transport, the second batch substrate transporting robot handles precise transfer to the posture turning unit, and the posture turning unit handles orientation conversion. This segmentation allows each component to be optimized for its specific function while maintaining overall system efficiency
2Reliability
If the posture turning mechanism uses side walls to grip substrates during rotation, then the substrates are securely held during posture change, but the mechanism becomes more complex and requires more space
Solution Approach 1:
The gripping function is extracted from the side walls and assigned to dedicated gripping mechanisms (such as claws or vacuum grippers) on the posture turning unit. This allows the side walls to be simplified or removed, reducing the overall mechanism complexity and space requirements while maintaining secure substrate holding during the posture change
3Productivity
If the single-wafer substrate transporting robot is positioned to easily access substrates after posture turning, then the substrate transfer efficiency is improved, but the batch substrate transport mechanism cannot receive substrates from the vertical position effectively
Solution Approach 1:
The second batch substrate transporting robot serves as a mediator that receives substrates in vertical posture from the first batch substrate transporting robot and delivers them to the posture turning unit. This intermediary allows the first robot to maintain its vertical reception capability while enabling efficient horizontal transfer to the posture turning unit for the single-wafer robot
Data Source
Figure 1
Figure 2
Figure 3A~3F
AI summary
Disclosed is a substrate treating apparatus. In the substrate treating apparatus, a pusher is provided at a position accessible by a first transport mechanism, and a posture turning unit is provided at a position accessible by a center robot. A second transport mechanism receives substrates in a vertical posture held by the pusher, and delivers the substrates to the posture turning unit. The second transport mechanism includes two horizontal chucks configured to hold the substrates in the vertical posture while radially supporting two side portions of each of the substrates. The posture turning unit includes an upper and lower chucks for radially supporting an upper portion and a lower portion of each of the substrates in the vertical posture held by the two horizontal chucks to receive the substrates in the vertical posture from the two horizontal chucks, and upper and lower chuck rotation unit for rotating the upper and lower chucks around a horizontal axis.