Substrate Pre-Coating Sequence for Stable Semiconductor Film Thickness
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Solution Overview
Problem
The existing substrate processing apparatuses face challenges in reducing downtime and improving productivity due to prolonged pre-coating times and film thickness drop phenomena during the manufacturing of semiconductor devices.
Innovation Solution
A technique involving the formation of a SiON film as a first pre-coated film and a SiOCN film as a second pre-coated film in the process container, with specific gas supply sequences and thickness settings, to shorten pre-coating time and downtime, while maintaining film quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single-layer pre-coated film is formed in the process container, then the pre-coating process is simple, but the pre-coating time is prolonged and film thickness drop occurs
Solution Approach 1:
The pre-coated film is divided into two distinct layers: a first pre-coated film formed from a nitrogen-containing processing gas, and a second pre-coated film formed from a carbon-containing processing gas. This segmentation allows each layer to perform specific functions, reducing overall pre-coating time while preventing film thickness drop during substrate processing.
Solution Approach 2:
The pre-coating structure uses a composite of two different materials with distinct chemical compositions and properties. The first layer (nitrogen-containing) and second layer (carbon-containing) work together to provide both time reduction and film thickness stability, achieving what a single homogeneous layer cannot accomplish.
2Manufacturing precision
If a thick pre-coated film is formed to prevent film thickness drop, then film quality is maintained, but pre-coating time increases
Solution Approach 1:
Instead of forming one thick pre-coated film, the structure segments the total thickness into two thinner layers with different materials. The first nitrogen-containing layer and second carbon-containing layer together provide sufficient coverage to prevent film thickness drop, but each layer is thin enough to form quickly, reducing total pre-coating time.
Solution Approach 2:
The invention changes the chemical composition parameter of the pre-coated film by using two different materials (nitrogen-containing and carbon-containing) instead of a single material. This parameter change allows the pre-coating to achieve both speed and effectiveness, preventing film thickness drop without requiring excessive thickness.
3Device complexity
If conventional single-gas pre-coating is used, then the process is simple, but downtime of the substrate processing apparatus is prolonged
Solution Approach 1:
The pre-coating process is segmented into two sequential gas supply steps: first supplying a nitrogen-containing processing gas to form the first pre-coated film, then supplying a carbon-containing processing gas to form the second pre-coated film. This segmented approach reduces total pre-coating time and apparatus downtime compared to conventional single-gas methods.
Solution Approach 2:
The two-gas pre-coating process maintains continuous useful action by sequentially forming both pre-coated films without interrupting the pre-coating objective. The first gas layer is formed, then immediately followed by the second gas layer, creating a continuous process that minimizes downtime while achieving the dual benefit of time reduction and film thickness stability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly reduces pre-coating time by up to 60% and downtime, stabilizes film composition, and prevents film thickness drop and particle generation, enhancing the operating rate and quality of the substrate processing apparatus.
Implementation Method 1
forming a film on a substrate by supplying a first processing gas to the substrate in a process container
Implementation Method 2
forming a first pre-coated film, which has a first thickness and has a material different from a material of the film formed in (a), in the process container by supplying a second processing gas into the process container
Implementation Method 3
forming a second pre-coated film, which has a second thickness smaller than the first thickness and has the same material as the material of the film formed in (a), on the first pre-coated film formed in the process container by supplying a third processing gas into the process container
Data Source
AI summary
There is included (a) forming a film on a substrate by supplying a first processing gas to the substrate in a process container; (b) forming a first pre-coated film, which has a first thickness and has a material different from a material of the film formed in (a), in the process container by supplying a second processing gas into the process container in a state in which the substrate does not exist in the process container; and (c) forming a second pre-coated film, which has a second thickness smaller than the first thickness and has the same material as the material of the film formed in (a), on the first pre-coated film formed in the process container by supplying a third processing gas into the process container in the state in which the substrate does not exist in the process container.