Substrate Chamber Pressurization Using a Supercritical Fluid Bypass
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Solution Overview
Problem
The existing substrate processing methods using supercritical fluids are hindered by the time it takes to reach process pressure, which increases overall processing time and reduces throughput due to the need to pressurize both the buffer tank and chamber simultaneously.
Innovation Solution
A substrate processing apparatus and method that includes a bypass line allowing the fluid to be supplied directly from the pump to the chamber, bypassing the buffer tank, enabling a second pressurization step that accelerates the pressure reach within the chamber, thereby reducing the overall process time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a buffer tank is used to store and pressurize the supercritical fluid before supplying to the chamber, then the fluid supply system is stable and reliable, but the time to reach process pressure increases significantly
Solution Approach 1:
The patent divides the fluid supply path into two separate paths: a main supply line with a buffer tank for stable fluid storage, and a bypass line that allows direct supply from the pump to the chamber. This segmentation enables selective use of either path depending on the operational phase, resolving the contradiction between stability and speed.
Solution Approach 2:
The buffer tank is pre-filled with supercritical fluid and maintained at the required pressure in advance. During operation, the bypass line can immediately supply this pre-prepared fluid to the chamber without requiring pressurization time, achieving rapid pressure establishment while maintaining system reliability.
2Device complexity
If the pump pressurizes both the buffer tank and chamber simultaneously, then the system operates in a simplified single-path mode, but the overall processing time increases and throughput decreases
Solution Approach 1:
The patent implements dynamic switching between different supply paths using valves. The system can transition from a simple single-path mode (buffer tank only) to a dual-path mode (buffer tank and bypass line combined), optimizing the balance between structural simplicity and processing speed based on operational requirements.
Solution Approach 2:
The bypass line serves multiple functions: it provides a rapid pressurization path, enables direct pump-to-chamber supply for time-critical operations, and can operate independently or in conjunction with the buffer tank. This multi-functionality increases productivity without significantly complicating the overall system.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly shortens the time to reach process pressure by approximately 50% or more, enhancing throughput and efficiency in substrate processing.
Implementation Method 1
a pump provided on the main supply line to pressurize the fluid in the fluid storage and supply the fluid toward the chamber
Implementation Method 2
a bypass line bypassing the buffer tank to connect the pump to the chamber
Implementation Method 3
a treatment method of drying the treatment liquid by using a fluid in a supercritical state (hereinafter referred to as 'supercritical fluid') in which an interface between gas or liquid is not formed
Implementation Method 4
when a fluid is dried through a supercritical state by using both temperature and pressure control of the fluid, a gas-liquid equilibrium line is not passed, and thus it is possible to dry a substrate in a state essentially free of capillary force
Data Source
AI summary
The present disclosure relates to a substrate processing apparatus and a substrate processing method, and more particularly, to a substrate processing apparatus and a substrate processing method for reaching a process pressure more quickly when a supercritical fluid is supplied into a chamber of the substrate processing apparatus using a supercritical fluid, thereby reducing a processing time and improving throughput.