Rotating Substrate Pre-Wetting With Rear-Side Heating Uniformity
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Solution Overview
Problem
Existing substrate processing methods face challenges in achieving uniform temperature distribution and chemical liquid treatment uniformity across the substrate, leading to non-uniform processing results and increased waste liquid generation.
Innovation Solution
A substrate processing apparatus and method that involves supplying a heated fluid to the rear surface of the substrate while rotating it, combined with intermittent supply of a chemical liquid to the front surface, to enhance temperature uniformity and reduce chemical liquid consumption.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a temperature control liquid is supplied to the rear surface of the substrate to uniform temperature distribution, then in-plane uniformity of chemical liquid treatment is improved, but the complexity of the processing system increases
Solution Approach 1:
The patent applies preliminary action by performing a pre-treatment process before the main chemical liquid treatment. The pre-treatment includes heating the substrate to a predetermined temperature and supplying a pre-wetting liquid to the front surface, which prepares the substrate for subsequent chemical liquid treatment and ensures uniform processing results.
Solution Approach 2:
The patent implements periodic action by intermittently supplying the temperature control liquid to the rear surface of the substrate during the chemical liquid treatment process. This intermittent supply pattern maintains temperature uniformity while reducing overall liquid consumption and simplifying the processing system.
2Productivity
If chemical liquid is supplied to the front surface of the substrate while rotating it, then chemical liquid treatment is performed, but non-uniform temperature distribution leads to non-uniform processing results
Solution Approach 1:
The patent applies local quality by differentiating the treatment of the front and rear surfaces of the substrate. The front surface receives pre-wetting liquid and chemical liquid treatment, while the rear surface receives temperature control liquid. This localized differentiation ensures that each surface receives the appropriate treatment for achieving uniform processing results.
Solution Approach 2:
The patent implements parameter changes by controlling the temperature of the substrate through heated temperature control liquid supplied to the rear surface. By maintaining the substrate at a predetermined temperature, the chemical liquid treatment parameters remain consistent across the entire substrate surface, ensuring uniform processing.
3Temperature
If continuous supply of temperature control liquid is made to the rear surface, then temperature uniformity is maintained, but liquid consumption and waste generation increase
Solution Approach 1:
The patent implements periodic action by intermittently supplying the temperature control liquid to the rear surface of the substrate during the chemical liquid treatment process. This intermittent supply pattern maintains temperature uniformity while reducing overall liquid consumption and waste generation compared to continuous supply.
Solution Approach 2:
The patent applies preliminary action by heating the substrate to a predetermined temperature in the pre-treatment process before the main chemical liquid treatment. This preliminary heating reduces the need for continuous temperature control liquid supply during the subsequent treatment, thereby reducing liquid consumption.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Improves in-plane temperature uniformity and reduces chemical liquid usage, thereby minimizing waste generation and enhancing processing consistency.
Implementation Method 1
supplying a heated fluid to a second surface of the substrate... supplying a heated fluid to the second surface of the substrate and supplying a pre-wetting liquid to a first surface of the substrate, while rotating the substrate
Implementation Method 2
supplying a pre-wetting liquid to a first surface of the substrate... supplying a pre-wetting liquid to a first surface of the substrate
Data Source
AI summary
A substrate processing apparatus includes a substrate holder for holding a substrate having a first surface and a second surface in a horizontal posture; a rotational driver for rotating the substrate holder; a first fluid supply for supplying a fluid to the first surface; a second fluid supply for supplying a fluid to the second surface; and a controller. The controller performs: a pre-treatment process of supplying a heated fluid to the second surface and supplying a pre-wetting liquid to the first surface, while rotating the substrate at a first rotation speed; and a chemical liquid treatment process of performing, after the pre-treatment process is performed, a chemical liquid treatment on the first surface by supplying a chemical liquid to the first surface and concurrently supplying the heated fluid to the second surface intermittently, while rotating the substrate at a second rotation speed.