Substrate processing apparatus, substrate processing method, and filter
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Solution Overview
Problem
Existing substrate processing systems face challenges in maintaining consistent critical dimension (CD) of photoresist patterns due to chemical substances in the air reacting with the metal-containing resist film, leading to fluctuations and reduced productivity.
Innovation Solution
A chemical filter system is integrated into the substrate processing apparatus, comprising multiple filter parts aligned along the gas flow path to remove acidic, basic, and organic substances, ensuring that only purified gas reaches the processing area, thereby stabilizing the CD of the photoresist patterns.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a single filter is used to clean gas, then the device complexity is low, but it cannot remove multiple types of chemical substances (acidic, basic, organic) effectively
Solution Approach 1:
The filter system is divided into multiple independent filter parts (first filter part for acidic substances, second filter part for basic substances, third filter part for organic substances), each with specific removal capabilities. This segmentation allows the system to target and remove different types of chemical substances effectively while maintaining manageable complexity through modular design.
Solution Approach 2:
The gas cleaning system achieves multi-functionality by integrating multiple filter parts that can remove different types of chemical substances (acidic, basic, and organic) within a single apparatus. This universal approach ensures comprehensive gas purification without requiring separate systems for each substance type.
2Reliability
If the filter processes all chemical substances simultaneously, then the purification effectiveness is high, but the filter lifespan is reduced due to rapid saturation
Solution Approach 1:
By segmenting the filter into specialized parts that target specific substance types, each filter part operates at optimized capacity rather than being overwhelmed by all substances simultaneously. This extends the operational lifespan of each filter component while maintaining high overall purification effectiveness for consistent CD control.
Solution Approach 2:
Each filter part is designed with local quality - the first filter part is optimized for acidic substances, the second for basic substances, and the third for organic substances. This specialized design ensures that each component operates at peak efficiency for its target substances, extending overall system lifespan while maintaining high purification reliability.
3Reliability
If frequent filter replacements are performed, then the gas purity is maintained, but the productivity is reduced due to downtime
Solution Approach 1:
The segmented filter design allows for selective replacement of individual filter parts based on their specific saturation rates. Since different filter parts handle different substance types, they can be replaced independently rather than replacing the entire system, minimizing downtime and maintaining high productivity while ensuring gas purity.
Solution Approach 2:
The modular filter parts can be discarded and replaced independently when saturated, rather than replacing the entire filter system. This approach minimizes waste and reduces replacement frequency, as only the specific saturated component needs replacement, thereby maintaining productivity while ensuring continuous gas cleanliness.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The chemical filter system effectively reduces fluctuations in CD by removing harmful substances, prolongs the lifespan of the filter components, and minimizes the frequency of filter replacements, enhancing the overall productivity of the substrate processing system.
Implementation Method 1
an acid filter part that removes an acidic substance
Implementation Method 2
an acid filter part that removes an acidic substance
Implementation Method 3
a base filter part that removes a basic substance
Implementation Method 4
a base filter part that removes a basic substance
Implementation Method 5
a chemical filter including a plurality of filter parts aligned towards a down-stream side on a flow path that supplies gas into the substrate processing apparatus to remove respective different substances in the gas
Data Source
AI summary
A substrate processing apparatus according to the present disclosure to be used in patterning that is executed by exposing and developing a metal containing resist film formed on a substrate, wherein a chemical filter is arranged in the substrate processing apparatus, the chemical filter including a plurality of filter parts aligned towards a down-stream side on a flow path that supplies gas into the substrate processing apparatus to remove respective different substances in the gas, and the plurality of filter parts includes: an acid filter part that removes an acidic substance; and a base filter part that removes a basic substance.