Substrate Processing Apparatus Liquid Collection Cup

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Solution Overview

Problem

Existing substrate processing apparatuses face inefficiencies in liquid collection and processing due to liquid deposition on chamber walls, leading to reduced recycling efficiency, particle generation, and potential heat/smoke issues from mixed processing liquids, while also requiring larger chamber volumes to minimize gas usage.

Innovation Solution

A substrate processing apparatus with a sealed chamber design, including a cup part outside the chamber to collect processing liquids, a rotating substrate mechanism, and a top plate mechanism to prevent liquid from dropping onto the substrate, allowing for efficient liquid collection and processing in a compact space.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If processing liquids are supplied onto the substrate in a chamber, then various processings such as etching can be performed, but processing liquids are deposited onto the chamber inner wall which reduces collection efficiency and shortens liquid lifetime

Engineering Contradiction:
Improveprocessing efficiencyVSAvoidprocessing liquid loss
Core Design Contradiction:
ProductivityVSLoss of substance

Solution Approach 1:

The liquid receiving part is extracted from the chamber interior to the chamber exterior. The cup part is positioned on the outer side of the chamber relative to the substrate, allowing processing liquids to be collected outside the chamber where they do not deposit on chamber walls, thereby maintaining collection efficiency and extending liquid lifetime.

Inventive Principle:
Principle #2Taking out (Extraction)

2Adaptability or versatility

If multiple processing liquids are used in one chamber, then various processings can be performed, but deposits on the chamber inner wall cause particles and heat/smoke generation

Engineering Contradiction:
Improveprocessing versatilityVSAvoidparticle generation
Core Design Contradiction:
Adaptability or versatilityVSObject-affected harmful factors

Solution Approach 1:

The liquid receiving part is extracted from the chamber interior to the chamber exterior. By positioning the cup part outside the chamber, processing liquids from multiple different processes are collected in a separate location, preventing deposits on chamber walls that would otherwise generate particles and heat/smoke when multiple liquids mix.

Inventive Principle:
Principle #2Taking out (Extraction)

3Quantity of substance

If the chamber volume is reduced to minimize gas usage, then gas consumption is reduced, but it becomes difficult to collect processing liquids efficiently

Engineering Contradiction:
Improvegas consumptionVSAvoidprocessing liquid collection efficiency
Core Design Contradiction:
Quantity of substanceVSLoss of substance

Solution Approach 1:

The liquid collection function is moved from the horizontal plane within the chamber to a vertical arrangement where the cup part extends outward from the chamber. This dimensional change allows efficient liquid collection in a compact chamber volume by utilizing the space outside the chamber for liquid reception.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

4Loss of substance

If a large chamber volume is used to collect processing liquids, then liquid collection is efficient, but the amount of gas required for processing increases

Engineering Contradiction:
Improveprocessing liquid collection efficiencyVSAvoidgas consumption
Core Design Contradiction:
Loss of substanceVSQuantity of substance

Solution Approach 1:

The liquid receiving part is extracted from the chamber interior to the chamber exterior. This separation allows the chamber volume to remain small for minimal gas consumption, while the externally positioned cup part provides sufficient space for efficient processing liquid collection without increasing chamber size.

Inventive Principle:
Principle #2Taking out (Extraction)

Data Source

PatentUS10734252B2Substrate processing apparatus
Publication Date: 2020.08.04 SCREEN HOLDINGS CO LTD
  • US10734252B2 patent drawing
  • US10734252B2 patent drawing
  • US10734252B2 patent drawing

AI summary

A substrate processing apparatus includes a chamber, a substrate holding part, a substrate rotating mechanism, and a processing liquid supply part. The chamber includes a chamber body and a chamber cover, and the chamber cover is moved up and down by a chamber opening and closing mechanism. A top plate is attached to the chamber cover. While the chamber cover is in contact with the chamber body, a sealed space is formed and processing is performed. When the chamber cover is moved up, an annular opening is formed between the chamber cover and the chamber body. A cup part is positioned outside the annular opening. A processing liquid spattering from a substrate is received by the cup part.