Substrate Processing Device Connection Unit for Particle Isolation

Resolve Bottlenecks,
Find Innovative SolutionsGenerate Solutions

Solution Overview

Problem

In substrate processing devices, maintenance of processing modules leads to particle contamination and requires stopping the device's operation, as particles flow into the atmospheric transfer device through connection portions, affecting wafer transfer and processing quality.

Innovation Solution

A substrate processing device with a transfer chamber and processing units, including load-lock chambers, features a connection unit with an opening and closing mechanism to prevent particle inflow during maintenance, allowing continuous operation by isolating the processing units from the transfer chamber.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of repair

If the processing module is separated from the atmosphere transfer device for maintenance, then the device can be maintained, but particles flow into the atmosphere transfer device causing wafer contamination and the device operation must be stopped

Engineering Contradiction:

Improvemaintenance accessibilityVSAvoidparticle contamination

Core Design Contradiction:

Ease of repairVSObject-affected harmful factors

Solution Approach 1:

The processing module is divided into separable components that can be detached from the atmosphere transfer device for maintenance, while the opening/closing mechanism remains integrated to prevent contamination. This segmentation allows maintenance personnel to access and service processing modules independently without compromising the sealed environment of the transfer device.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The opening/closing mechanism acts as an intermediary element between the processing module and the atmosphere transfer device. It controls the connection and disconnection states, ensuring that when the processing module is detached for maintenance, the opening is automatically closed to prevent particle inflow, thus mediating between maintenance needs and contamination prevention.

Inventive Principle:

Principle #24Intermediary (Mediator)

2Ease of repair

If the processing module is separated from the atmosphere transfer device for maintenance, then maintenance can be performed, but the operation of the substrate processing device must be stopped

Engineering Contradiction:

Improvemaintenance accessibilityVSAvoiddevice operation continuity

Core Design Contradiction:

Ease of repairVSProductivity

Solution Approach 1:

The system is segmented into multiple processing modules that can be independently maintained. When one module is detached for maintenance, other modules remain connected and operational, allowing the device to continue processing substrates through alternative pathways, thus maintaining productivity while enabling repairs.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The atmosphere transfer device maintains continuous operational capability by allowing selective detachment of processing modules. The opening/closing mechanism ensures that while one module is being maintained, the sealed environment for other modules remains intact, enabling uninterrupted substrate transfer and processing operations to continue without interruption.

Inventive Principle:

Principle #20Continuity of useful action

3Object-affected harmful factors

If the opening of the connection unit is closed to prevent particle inflow, then wafer quality is maintained, but the processing module cannot be accessed for maintenance

Engineering Contradiction:

Improveparticle contamination preventionVSAvoidprocessing module accessibility

Core Design Contradiction:

Object-affected harmful factorsVSEase of repair

Solution Approach 1:

The opening/closing mechanism provides dynamic control over the connection between the processing module and the atmosphere transfer device. The opening state can be changed from closed (preventing contamination) to open (allowing maintenance access) as needed. This dynamic capability resolves the contradiction by allowing the system to adapt its state based on whether maintenance or contamination prevention is the priority.

Inventive Principle:

Principle #15Dynamics

Solution Approach 2:

The opening/closing mechanism serves as an intermediary that mediates between the conflicting requirements of contamination prevention and maintenance access. It provides a controlled transition state that allows the processing module to be safely detached and reattached, ensuring that the opening is closed during normal operation to prevent particle inflow while being open only when maintenance is required.

Inventive Principle:

Principle #24Intermediary (Mediator)

Data Source

PatentUS11527426B2Substrate processing device

Publication Date: 2022.12.13 TOKYO ELECTRON LTD

AI summary

A substrate processing device includes a transfer chamber configured to transfer a substrate under an atmospheric atmosphere and a plurality of processing units each including at least one processing chamber for processing the substrate under a vacuum atmosphere and at least one load-lock chamber connected to the processing chamber to switch an inner atmosphere thereof between the atmospheric atmosphere and the vacuum atmosphere. The transfer chamber includes a connection unit configured to connect the transfer chamber and the load-lock chamber such that each of the processing units is detachably attached. The connection unit includes an opening that allows the transfer chamber to communicate with the load-lock chamber, and an opening/closing mechanism configured to open and close the opening portion.