Substrate Processing Device Ultraviolet Irradiation Atmosphere Control
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional substrate processing devices face challenges in achieving a predetermined atmosphere quickly due to air remaining in the space between the substrate and the ultraviolet irradiator, leading to attenuation of ultraviolet light and potential damage from electrical charging.
Innovation Solution
A substrate processing device is designed with a tubular member and gas supply units that create a barrier to prevent air from the non-active space from entering the active space, using strategically positioned openings and grooves to facilitate gas flow and maintain a predetermined atmosphere efficiently.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If gas supply is increased to achieve predetermined atmosphere faster, then throughput is improved, but ultraviolet light intensity attenuates due to oxygen absorption
Solution Approach 1:
The space around the substrate is segmented into multiple regions with separate gas supply paths. The side surface space receives gas from side openings to prevent air inflow, while the active space receives gas through the substrate holding table. This segmentation allows independent control of gas flow in different regions, achieving rapid atmosphere establishment without excessive oxygen accumulation that would absorb ultraviolet light.
Solution Approach 2:
Different regions are provided with different gas supply characteristics. The side surface space receives gas flow directed along the side surface to create a barrier, while the active space receives gas supply optimized for ultraviolet irradiation. This local differentiation ensures that each region has the appropriate gas composition and flow rate for its specific function, maintaining both rapid atmosphere achievement and adequate ultraviolet light transmission.
2Reliability
If gas flow rate is increased to prevent air from entering active space, then atmosphere stability is improved, but energy consumption increases
Solution Approach 1:
Gas is supplied to the side surface space before the active space to establish a protective gas barrier in advance. The side openings deliver gas along the side surface of the substrate holding table, creating a preliminary gas layer that prevents air from entering the active space. This preliminary action reduces the need for continuous high-rate gas supply to the active space, thereby maintaining atmosphere stability with lower energy consumption.
3Speed
If ultraviolet irradiation is started immediately, then processing speed is improved, but electrical charging damage occurs
Solution Approach 1:
Gas supply to the active space is initiated before ultraviolet irradiation begins, establishing the predetermined atmosphere in advance. This preliminary gas supply removes air from the active space, preventing oxygen absorption of ultraviolet light and eliminating the electrical charging problem. Once the appropriate atmosphere is established, ultraviolet irradiation can start immediately without delay, achieving both safety and speed.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration allows for a faster achievement of the predetermined atmosphere, enhancing the throughput of substrate processing by preventing air from deviating the atmosphere and ensuring uniform gas distribution, thus improving the efficiency of ultraviolet light irradiation.
Implementation Method 1
an ultraviolet irradiator disposed to face the substrate with an active space therebetween and supplied with a predetermined atmosphere and configured to irradiate the substrate with ultraviolet light
Implementation Method 2
gas flowing through the space (hereinafter referred to as a communication space) between the side surface of the substrate holding table and the inner surface of the tubular member functions as a barrier against gas flowing to the active space
Implementation Method 3
The ultraviolet light changes oxygen in the space into ozone. The ozone promotes the hydrophilic characteristic of the glass substrate
Data Source
AI summary
A substrate processing device includes a substrate holding table, an ultraviolet irradiator, a tubular member, a first gas supplying unit, and a second gas supplying unit. The ultraviolet irradiator is disposed facing to the substrate through an active space and configured to irradiate the substrate with ultraviolet light. The tubular member includes an inner surface surrounding a side surface of the substrate holding table, and at least one opening at a position facing to the side surface on the inner surface. The first gas supplying unit supplies gas to a space between the side surface of the substrate holding table and the inner surface of the tubular member through the at least one opening. The second gas supplying unit supplies gas to an active space between the substrate and the ultraviolet irradiator.