Substrate Processing Apparatus Turbulent Flow Guide Cover

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Solution Overview

Problem

Conventional substrate processing apparatuses face challenges in increasing processing rate without causing the processing liquid to spout or the substrate holder to float, while also ensuring uniform processing, as high flow velocities lead to laminar flows that may result in non-uniform processing.

Innovation Solution

The substrate processing apparatus incorporates a guide cover, processing-liquid nozzles, baffle plates, paddle mechanisms, inert-gas supply nozzles, and elastic membranes to create a descending turbulent flow that prevents spouting and floating, ensuring uniform coverage of the substrate with the processing liquid.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the flow velocity of the processing liquid in the inner chamber is increased to increase processing rate, then the processing rate is improved, but the processing liquid may spout from the inner chamber or the substrate holder may be floated up

Engineering Contradiction:

Improveprocessing rateVSAvoidstability of substrate holder and processing liquid

Core Design Contradiction:

ProductivityVSReliability

Solution Approach 1:

The processing chamber is divided into an inner chamber and an outer chamber. The inner chamber houses the substrate holder and experiences descending flow, while the outer chamber experiences ascending flow. This segmentation allows the system to achieve high processing rates through controlled descending flow in the inner chamber without causing spouting or floating, as the outer chamber's ascending flow provides counterbalancing pressure support.

Inventive Principle:

Principle #1Segmentation

2Productivity

If the flow velocity of the processing liquid in the inner chamber is increased to increase processing rate, then the processing rate is improved, but the processing liquid forms a laminar flow that may result in non-uniform processing of the substrate

Engineering Contradiction:

Improveprocessing rateVSAvoiduniformity of substrate processing

Core Design Contradiction:

ProductivityVSManufacturing precision

Solution Approach 1:

Instead of using ascending flow (conventional approach) in the inner chamber, the invention employs descending flow. The liquid delivery pipe delivers processing liquid to the upper portion of the inner chamber, and the pump sucks liquid from the bottom, creating a downward flowing pattern. This inverted flow direction creates turbulent flow that enhances uniformity while maintaining high processing rates.

Inventive Principle:

Principle #13The other way round (Inversion)

Solution Approach 2:

The system dynamically controls the flow characteristics by adjusting pump operation to create turbulent flow conditions in the inner chamber. The descending flow pattern, combined with the chamber geometry and liquid delivery mechanism, generates dynamic mixing and circulation patterns that ensure uniform substrate processing at high velocities.

Inventive Principle:

Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration allows for increased flow velocity of the processing liquid without spouting or floating, resulting in uniform processing of the substrate with enhanced processing rates and prevention of local processing issues.

Implementation Method 1

a pump coupled to the liquid delivery pipe and configured to suck the processing liquid from the inner chamber through the liquid delivery pipe and to deliver the processing liquid to the outer chamber through the liquid delivery pipe

Methodology Applied

Scientific EffectPump: Pump

Implementation Method 2

create a descending turbulent flow that prevents spouting and floating, ensuring uniform coverage of the substrate with the processing liquid

Methodology Applied

Scientific EffectTurbulent flow: Turbulence

Data Source

PatentUS11024520B2Substrate processing apparatus

Publication Date: 2021.06.01 EBARA CORP

AI summary

The substrate processing apparatus includes a processing chamber including an outer chamber configured to hold a processing liquid and an inner chamber capable of surrounding the substrate held by the substrate holder; a liquid delivery pipe having one end coupled to a bottom of the inner chamber and other end coupled to the outer chamber; a pump configured to suck the processing liquid from the inner chamber through the liquid delivery pipe and to deliver the processing liquid to the outer chamber through the liquid delivery pipe; and a guide cover having a through-hole in which the substrate holder can be inserted. The guide cover is located below an upper end of the outer chamber and above the inner chamber.