Substrate Processing Apparatus Ion Stream Charge Dissipation

Resolve Bottlenecks,
Find Innovative SolutionsGenerate Solutions

Solution Overview

Problem

Existing substrate processing apparatuses face challenges in dissipating charges from the shielding plate without complicating the structure, which can lead to particle adsorption and potential damage to substrates, especially when using combustible chemical solutions.

Innovation Solution

A substrate processing apparatus with a rotating opposing member that generates and supplies ions to the treatment atmospheric gas, forming an ion stream to dissipate charges from the opposing member, preventing particle adsorption and substrate damage.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If feeble X rays are applied to dissipate charges from the shielding plate, then charges are dissipated effectively, but the apparatus structure becomes complicated and increases in size

Engineering Contradiction:

Improvecharge dissipation effectivenessVSAvoidapparatus structure complexity

Core Design Contradiction:

ReliabilityVSDevice complexity

Solution Approach 1:

The patent replaces the complex X-ray charge dissipation mechanism with a simpler airflow-based system. A fan generates air flow that moves across the shielding plate surface, effectively dissipating charges through electrostatic induction without requiring X-ray generation equipment, thereby simplifying the apparatus structure while maintaining charge dissipation functionality

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent introduces air flow as an intermediary medium to transfer charge dissipation function. Instead of directly applying X-rays to the shielding plate, the system uses air flow as a mediator that carries away charged particles and prevents charge accumulation, achieving the same effect through a different physical mechanism

Inventive Principle:

Principle #24Intermediary (Mediator)

2Reliability

If the shielding plate is positioned in close proximity to the substrate before dry processing, then charge dissipation is improved, but the risk of particle adsorption and substrate damage increases

Engineering Contradiction:

Improvecharge dissipation effectivenessVSAvoidparticle adsorption and substrate damage risk

Core Design Contradiction:

ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The patent applies charge dissipation treatment to the shielding plate before the substrate is placed in close proximity. By pre-dissipating charges on the shielding plate surface through air flow, the system eliminates the source of electrostatic attraction that would cause particle adsorption and substrate damage when components are positioned close together

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The patent applies counter-action in advance by generating air flow to oppose charge accumulation on the shielding plate before the substrate positioning occurs. This preliminary anti-action prevents the formation of electrostatic fields that would otherwise attract particles and cause discharge damage to the substrate

Inventive Principle:

Principle #9Preliminary anti-action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The apparatus effectively dissipates charges from the opposing member and substrate with a simpler structure, preventing particle adsorption and allowing the use of combustible chemical solutions, while reducing the complexity and size of the processing apparatus.

Implementation Method 1

an ion generator that generates and supplies ions to the treatment atmospheric gas supplied from the gas supply part

Methodology Applied

Scientific EffectIon generation: Ionisation

Implementation Method 2

supply the treatment atmospheric gas that contains the ions to the lower space and form an ion stream that spreads radially outward from the radial central part of the lower space

Methodology Applied

Scientific EffectElectrostatic charge dissipation: Electrostatic Discharge

Data Source

PatentUS11211264B2Substrate processing apparatus and substrate processing method

Publication Date: 2021.12.28 SCREEN HOLDINGS CO LTD

AI summary

A substrate rotation mechanism rotates the substrate holder about a central axis. A top plate opposes the upper surface of the substrate and rotates about the central axis. A gas supply part supplies a treatment atmospheric gas to a radial central part of a lower space that is a space below the top plate. An ion generator generates and supplies ions to the treatment atmospheric gas supplied from the gas supply part. Then, in a state in which the top plate is positioned lower than when the substrate is transported into the apparatus, the treatment atmospheric gas that contains the ions is supplied to the lower space to form an ion stream that spreads radially outward from the radial central part of the lower space while rotating the substrate holder and the top plate. Accordingly, charges can be dissipated from the top plate with a simple structure.