Substrate Processing Apparatus Laminar Flow Design
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional substrate processing apparatuses often result in turbulent flows during processing, which can lead to inefficient processing and redepositing of residues on the substrate, due to the lack of consideration for forming a stable laminar flow along the substrate surface.
Innovation Solution
A substrate processing apparatus is designed with a support tray and storage container configuration that allows for the formation of a stable laminar flow by supplying processing fluid horizontally from a discharge port positioned above the support tray, ensuring the fluid flows along the substrate surface without colliding with the tray or ceiling, thereby preventing turbulence.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If the processing fluid is supplied from the side of the space in which the substrate is disposed, then the apparatus structure is simple, but turbulent flow occurs due to collision with the substrate or holding plate
Solution Approach 1:
The discharge port is repositioned from a lateral position to an overhead position, changing the spatial dimension of fluid supply. The fluid is discharged from above the support tray in a direction toward the substrate, allowing laminar flow to form without colliding with the substrate edge or holding plate, thus resolving the contradiction between simple structure and flow stability
2Device complexity
If turbulent flow occurs during processing, then the apparatus can be simple, but processing efficiency decreases and redepositing increases
Solution Approach 1:
The discharge port is positioned overhead to enable vertical-to-horizontal flow transition, creating laminar flow that efficiently penetrates substrate patterns and prevents redepositing, thereby improving processing efficiency without complicating the apparatus structure
Solution Approach 2:
The flow regime is changed from turbulent to laminar by modifying the discharge position and direction parameters. This parameter change ensures that the processing fluid flows smoothly along the substrate surface, improving processing efficiency and preventing redepositing of residues
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus achieves efficient processing by facilitating a stable laminar flow that penetrates deep into substrate patterns, improving processing efficiency and preventing redepositing of residues on the substrate surface.
Implementation Method 1
it is preferable that the processing fluid flows as a laminar flow along the surface of the substrate
Implementation Method 2
a supercritical fluid having a lower surface tension than a liquid penetrates deep into gaps among the pattern
Implementation Method 3
the risk of pattern collapse caused by the surface tension during drying may be reduced
Data Source
AI summary
A substrate processing apparatus processes a surface of a substrate with a processing fluid and includes a support tray in which a concave part for housing the substrate is provided on an upper surface thereof; a storage container in which a cavity is formed, wherein the support tray may be stored in a horizontal posture in the cavity; and a fluid supply part supplying the processing fluid to the cavity, wherein the storage container has a flow path which receives the processing fluid and discharges the processing fluid in a horizontal direction into the cavity from a discharge port that opens on a side wall surface of the cavity and toward the cavity, and a lower end position of the discharge port in a vertical direction is the same as or higher than a position of the upper surface of the support tray stored in the cavity.