Substrate Processing Liquid Supply System Temperature Uniformity
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Solution Overview
Problem
Existing substrate processing apparatuses face challenges in achieving temperature and processing uniformity due to the gradual decrease in processing liquid temperature as it flows from the central to the peripheral edge of the substrate, leading to reduced processing efficiency and increased liquid consumption.
Innovation Solution
A substrate processing apparatus with a processing liquid supplying system that includes a supply flow passage branching into multiple upstream flow passages, allowing for multiple discharge ports positioned at varying distances from the rotational axis, and a mixing ratio changing unit to adjust the temperature of the processing liquid, ensuring uniform temperature distribution across the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of time
If the flow rate of the processing liquid discharged from the nozzle is increased to reduce the time taken for the processing liquid to reach the upper surface peripheral edge portion of the substrate, then the time taken for processing is reduced, but the consumption amount of the processing liquid increases
Solution Approach 1:
The single nozzle is divided into multiple nozzles (first nozzle and second nozzle) positioned at different radial distances from the rotational axis. Each nozzle discharges processing liquid onto different regions of the substrate, allowing simultaneous coverage of both central and peripheral areas without requiring excessive flow rate from a single point.
Solution Approach 2:
Different nozzles are positioned to discharge processing liquid at different locations on the substrate - the first nozzle targets the central portion while the second nozzle targets the peripheral portion. This localized discharge strategy ensures that each region receives adequate processing liquid with appropriate temperature and flow characteristics.
2Area of stationary object
If the processing liquid flows from the central portion to the peripheral edge portion along the upper surface of the substrate, then the entire upper surface is covered, but the temperature of the processing liquid decreases gradually leading to reduced temperature uniformity
Solution Approach 1:
The processing liquid discharge is segmented into multiple nozzles positioned at different radial locations. The first nozzle discharges liquid onto the central portion while the second nozzle discharges liquid onto the peripheral portion, allowing simultaneous temperature maintenance across different regions without relying on liquid flowing from center to periphery.
Solution Approach 2:
The processing liquid is pre-heated to a higher temperature before discharge to compensate for the temperature drop that occurs during flow and contact with the substrate. This preliminary heating ensures that even after flowing across the substrate surface, the liquid maintains sufficient temperature for effective processing.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances temperature and processing uniformity across the substrate while reducing the consumption of processing liquid by maintaining consistent quality and temperature through the use of multiple discharge ports and controlled mixing ratios, improving overall processing efficiency.
Implementation Method 1
a processing liquid supplying system supplying the substrate held by the substrate holding unit with a processing liquid including a first liquid and a second liquid that generate heat upon mixing with each other
Data Source
AI summary
A supply flow passage branches into a plurality of upstream flow passages. A plurality of discharge ports are respectively disposed at a plurality of positions differing in distance from a rotational axis of a substrate. Hydrogen peroxide water, that is one of components of a chemical liquid (SPM), is supplied to the upstream flow passage from a component liquid flow passage. A mixing ratio changing unit including a plurality of first flow control valves and a plurality of second flow control valves independently changes mixing ratios of sulfuric acid and hydrogen peroxide water included in the chemical liquid to be discharged from the plurality of discharge ports for each of the upstream flow passages.