Semiconductor Substrate Processing Apparatus Position Tracking

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Solution Overview

Problem

The management of substrate processing apparatuses in semiconductor manufacturing is inefficient due to challenges in production efficiency, placement optimization for higher integration and miniaturization of circuits, and the need for flexible arrangement of apparatuses to accommodate various processes and new technologies.

Innovation Solution

A substrate processing system that includes a process chamber, a position information acquisition part, a memory device, and an information controller to store and output position information, enabling efficient management and monitoring of substrate processing apparatuses through a networked group management apparatus.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If multiple substrate processing apparatuses are installed in a clean room for semiconductor manufacturing, then production capacity increases, but management efficiency deteriorates due to difficulty in tracking and monitoring each apparatus

Engineering Contradiction:

Improveproduction capacityVSAvoidmanagement efficiency

Core Design Contradiction:

ProductivityVSEase of operation

Solution Approach 1:

The system implements automatic feedback by having each substrate processing apparatus report its position information to the group management apparatus. This creates a continuous information loop where the management system receives real-time status updates without requiring manual intervention, thereby maintaining management efficiency while handling multiple apparatuses.

Inventive Principle:

Principle #23Feedback

Solution Approach 2:

Each substrate processing apparatus autonomously manages its own position information by acquiring, storing, and reporting it automatically. This self-service mechanism eliminates the need for manual tracking by operators, allowing the system to scale to multiple apparatuses without increasing management complexity.

Inventive Principle:

Principle #25Self-service

2Adaptability or versatility

If substrate processing apparatuses are relocated frequently to accommodate new processes and technologies, then adaptability improves, but management complexity increases due to tracking changes

Engineering Contradiction:

Improveflexibility in arrangementVSAvoidmanagement complexity

Core Design Contradiction:

Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The system is designed to be dynamic, automatically detecting and reporting position changes when apparatuses are relocated. The position information acquisition component continuously monitors and updates apparatus locations, allowing frequent reconfigurations without increasing management complexity since the system adapts automatically to changes.

Inventive Principle:

Principle #15Dynamics

Solution Approach 2:

The system proactively acquires and stores position information before changes become problematic. By continuously monitoring apparatus positions and maintaining updated records in the group management apparatus, the system is prepared for any reconfiguration needs without adding management burden.

Inventive Principle:

Principle #10Preliminary action

3Measurement precision

If position information of substrate processing apparatuses is manually tracked, then management precision is maintained, but time consumption increases

Engineering Contradiction:

Improveposition information accuracyVSAvoidtime consumption

Core Design Contradiction:

Measurement precisionVSLoss of time

Solution Approach 1:

The system replaces manual mechanical tracking with an automated electronic information system. Each apparatus automatically acquires and transmits its position data through communication interfaces, eliminating the need for manual record-keeping while maintaining accurate position information and significantly reducing time consumption.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The group management apparatus serves as an intermediary that automatically collects, stores, and manages position information from multiple substrate processing apparatuses. This centralized information hub eliminates the need for individual manual tracking at each apparatus while ensuring accurate and timely position data is maintained.

Inventive Principle:

Principle #24Intermediary (Mediator)

Data Source

PatentUS10930533B2Substrate processing apparatus, substrate processing system and method of manufacturing semiconductor device

Publication Date: 2021.02.23 KOKUSAI DENKI KK

AI summary

Described herein is a technique capable of capable of managing a substrate processing apparatus efficiently. According to one aspect of the technique described herein, there is provided a substrate processing apparatus including: a process chamber where a substrate is processed; a position information acquisition part configured to acquire position information of the process chamber; a memory device configured to store the position information; and an information controller configured to cause the position information acquired by the position information acquisition part to be stored in the memory device and the position information stored in the memory device to be outputted.