Substrate Processing System Priority Control
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Solution Overview
Problem
The uniformity of process results for substrates in semiconductor manufacturing is compromised due to individual variations in substrate processing apparatuses, leading to decreased throughput and yield, as there is no effective index for correcting these variations, resulting in the potential generation of defective products.
Innovation Solution
A substrate processing system that includes multiple apparatuses connected through a network with a control part to transmit and receive data, allowing for the generation of priority data based on apparatus performance, which is then used to adjust parameters and optimize the process, thereby improving uniformity and throughput.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If substrate processing is performed using multiple apparatuses, then manufacturing throughput is improved, but process uniformity deteriorates due to individual variations in each apparatus
Solution Approach 1:
The system implements a feedback mechanism where process results from each substrate processing apparatus are measured and fed back to a central control part. The control part generates priority data based on this feedback and transmits it to the respective apparatuses. This closed-loop feedback system enables continuous monitoring and adjustment of individual apparatus performance, allowing the system to maintain process uniformity across multiple apparatuses while preserving the throughput benefits of parallel processing.
Solution Approach 2:
The system dynamically changes operating parameters of substrate processing apparatuses based on priority data. The control part transmits priority data indicating which apparatuses require parameter adjustments, and the affected apparatuses modify their process parameters accordingly. This parameter adaptation allows each apparatus to compensate for individual variations, thereby improving process uniformity without sacrificing the productivity gains from using multiple apparatuses.
2Device complexity
If individual apparatus variations are not corrected, then apparatus complexity is reduced, but product quality deteriorates due to defective products
Solution Approach 1:
The system introduces a central control part as an intermediary between substrate processing apparatuses and the quality assurance function. This control part receives process result data from multiple apparatuses, analyzes individual variations, generates priority data, and transmits adjustment instructions. By placing this intermediary layer, the system achieves product quality improvement without significantly increasing the complexity of individual apparatuses, as the control logic is centralized rather than distributed across each device.
3Manufacturing precision
If process adjustments are made to correct apparatus variations, then process uniformity is improved, but adjustment time increases
Solution Approach 1:
The system performs preliminary actions by continuously monitoring process results and generating priority data in advance of actual parameter adjustments. The control part analyzes apparatus performance trends and prepares adjustment instructions before uniformity degradation becomes severe. This preliminary action approach allows for proactive rather than reactive adjustments, reducing the overall time lost to corrections by addressing variations before they result in defective products or require extensive rework.
Data Source
AI summary
There is provided a substrate processing system, including: a plurality of substrate processing apparatuses; a first control part installed in each of the plurality of substrate processing apparatuses and configured to transmit a first apparatus data from each of the plurality of substrate processing apparatuses; a second control part configured to receive the first apparatus data from each of the plurality of substrate processing apparatuses, generate a priority data of each of the plurality of substrate processing apparatuses based on the first apparatus data, and transmit the priority data to the first control part; and a display part configured to display the priority data thereon.