Substrate Processing Recipe Optimization via External Data Unit
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current substrate processing systems face inefficiencies in optimizing process recipes due to high computational loads on both substrate processing apparatuses and host computers, leading to decreased throughput and inability to manage target values effectively.
Innovation Solution
A method where a host computer sends commands to a substrate processing apparatus to execute process-recipe optimizing calculations through a connected data processing unit, allowing for automated optimization and updates of process recipes based on measured film thickness deviations, enabling the host computer to manage target values and control optimization processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Extent of automation
If the substrate processing apparatus itself performs data computing operation for optimizing process recipe, then the optimization can be executed autonomously, but the computational load increases causing deterioration of throughput
Solution Approach 1:
The patent extracts the data processing unit from the substrate processing apparatus to perform the computational operations externally. The substrate processing apparatus sends only necessary data to the external data processing unit, which executes the optimization calculations and returns results, thereby reducing the computational burden on the substrate processing apparatus and preventing throughput deterioration while maintaining autonomous optimization capability
2Adaptability or versatility
If the host computer manages target values and executes optimization calculation, then centralized control is achieved, but the load on host computer increases degrading overall factory throughput
Solution Approach 1:
The patent extracts the computational load from the host computer by implementing a dedicated data processing unit at the substrate processing apparatus level. The host computer retains centralized management of target values and sends commands to trigger optimization, but the actual calculations are performed locally by the data processing unit, preventing host computer overload and maintaining factory throughput
Solution Approach 2:
The patent segments the optimization system into three functional components: the host computer for centralized target value management and command issuance, the substrate processing apparatus for executing processes and providing data, and the data processing unit for performing optimization calculations. This segmentation distributes the computational load appropriately while maintaining centralized control
3Productivity
If a data processing unit is separated from the substrate processing apparatus, then computational load on the apparatus is reduced, but the system complexity increases due to network connection requirements
Solution Approach 1:
The patent introduces a data processing unit as an intermediary component that sits between the substrate processing apparatus and the host computer. This intermediary handles all computational operations, receiving data from the substrate processing apparatus via network connection and returning optimization results, thereby reducing the complexity burden on the substrate processing apparatus while maintaining system integration
Data Source
AI summary
The present invention is a method of optimizing a process recipe of a substrate processing system including: a substrate processing apparatus that performs a film deposition process of a substrate to be processed according to a process recipe; a data processing unit that executes a calculation for optimizing the process recipe; and a host computer; the substrate processing apparatus, the data processing unit, and the host computer being connected to each other through a network. The present invention includes the steps of: measuring a film thickness of a substrate to be processed that has been subjected to a film deposition process by the substrate processing apparatus; sending a command for conducting a process-recipe optimizing process from the host computer to the substrate processing apparatus, when the measured film thickness is deviated from a target film thickness and the deviation is beyond an allowable range; and in response to the command for conducing a process-recipe optimizing process from the host computer, sending required data from the substrate processing apparatus to the data processing unit, causing the data processing unit to execute a process-recipe optimizing calculation to calculate an optimum process recipe for achievement of the target film thickness, and updating the process recipe in the substrate processing apparatus based on the calculated result.