Substrate Processing Apparatus Segmented Conveyance for Contamination Control
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Solution Overview
Problem
Conventional substrate processing apparatuses contaminate substrates by transferring processing liquids from the liquid processing unit to the substrate conveyance unit, which are then carried to the supercritical drying unit, leading to contamination of the substrate surface after processing.
Innovation Solution
The apparatus includes separate conveyance units for dry and wet substrates, with the liquid processing unit and supercritical drying unit positioned to minimize cross-contamination, using distinct conveyance paths to prevent the transfer of processing liquids to the substrate after drying processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single substrate conveyance unit is used for both carry-in to liquid processing and carry-out from supercritical drying, then device complexity is reduced, but substrate surface contamination occurs due to processing liquid transfer
Solution Approach 1:
The conveyance system is segmented into three distinct units: first conveyance unit for dry substrate carry-in, second conveyance unit for wet substrate transfer, and third conveyance unit for dry substrate carry-out. This segmentation prevents processing liquid contamination by ensuring that the substrate conveyance path is divided into contamination-free zones.
Solution Approach 2:
The harmful element (processing liquid contamination) is extracted from the substrate conveyance path by separating the wet substrate transfer function into a dedicated second conveyance unit with liquid shielding, while the first and third conveyance units remain contamination-free for dry substrate handling.
2Object-affected harmful factors
If separate conveyance units are used for dry and wet substrates, then substrate surface contamination is prevented, but device complexity increases
Solution Approach 1:
While maintaining functional separation, the three conveyance units are merged into a coordinated system where the first and third conveyance units share the same physical path for substrate carry-in and carry-out, while the second conveyance unit provides liquid-shielded transfer. This merging reduces overall system complexity compared to completely independent conveyance paths.
Solution Approach 2:
The first conveyance unit serves dual purposes: conveying dry substrates into the liquid processing unit and conveying dry substrates out after supercritical drying. This multi-functionality reduces the total number of conveyance units needed while maintaining contamination prevention.
3Productivity
If the liquid processing unit is positioned to face the conveyance units, then substrate processing efficiency is improved, but processing liquid may transfer to the conveyance unit
Solution Approach 1:
The conveyance system exhibits local quality differentiation: the first and third conveyance units operate in contamination-free zones with dry substrate handling, while the second conveyance unit operates in a liquid-shielded zone for wet substrate transfer. This localized quality control prevents processing liquid transfer while maintaining processing efficiency.
Solution Approach 2:
The second conveyance unit acts as an intermediary with liquid shielding that mediates between the liquid processing unit and the contamination-free conveyance paths. It transfers wet substrates while preventing processing liquid from reaching the first and third conveyance units, thus eliminating harmful liquid transfer.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively prevents processing liquids from contaminating the substrate after drying, enhancing the yield rate and reducing the risk of surface contamination during the processing and drying stages.
Implementation Method 1
replacing the processing liquid remaining on the substrate with a fluid in a supercritical state (i.e., a supercritical fluid) and vaporizing the supercritical fluid
Implementation Method 2
vaporizing the supercritical fluid
Data Source
AI summary
Provided is a substrate processing apparatus including a liquid processing unit that performs a liquid processing on a substrate; a drying processing unit that performs a drying processing on the substrate in a wet state; a first conveyance unit that conveys the substrate to the liquid processing unit; a second conveyance unit that conveys the substrate in the wet state from the liquid processing unit to the drying processing unit; and a third conveyance unit that conveys the substrate before the liquid processing in the liquid processing unit and to convey the substrate after the drying processing from the drying processing unit. The first and second conveyance units and the drying processing unit are disposed on a side that faces the third conveyance unit, and the liquid processing unit is disposed on a side that faces the first and second conveyance units and is opposite to the third conveyance unit.