Substrate Processing Apparatus Solvent-Assisted Microphase Separation
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Solution Overview
Problem
Existing substrate processing technologies face difficulties in achieving appropriate microphase separation of directed self-assembly materials, which is crucial for forming finer patterns on substrates.
Innovation Solution
A substrate processing apparatus and method that includes a processing film formation unit for forming a directed self-assembly material film on a substrate, followed by thermal processing with solvent supply to promote microphase separation, using solvents like toluene, heptane, and tetrahydrofuran, and optionally incorporating exposure and development processing units for pattern formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If thermal processing is performed without solvent supply, then the processing is simpler, but microphase separation cannot be appropriately caused in various directed self assembly materials
Solution Approach 1:
A solvent supply unit is introduced as an intermediary component that delivers solvent vapor to the processing film during thermal processing. This mediator enables microphase separation in various directed self-assembly materials without requiring complex modifications to the thermal processing unit itself, thus improving reliability while maintaining reasonable device complexity
Solution Approach 2:
The system changes the chemical environment parameters by introducing solvent vapor during thermal processing. This parameter change (adding solvent vapor) enables appropriate microphase separation that cannot be achieved with thermal processing alone, resolving the contradiction between processing simplicity and separation effectiveness
2Manufacturing precision
If solvent is supplied during thermal processing, then microphase separation is promoted and fine patterns can be accurately formed, but the device complexity increases
Solution Approach 1:
The solvent supply unit is designed with multi-functionality, capable of supplying different types of solvents (toluene, heptane, acetone, propylene glycol monomethylether acetate, propylene glycol monomethylether, cyclohexanone, carbon disulfide, tetrahydrofuran) based on the specific directed self-assembly material being processed. This universal design improves pattern formation accuracy while avoiding the need for multiple separate processing units
Solution Approach 2:
The system dynamically adjusts the type and amount of solvent supplied based on the specific processing requirements. The solvent supply unit can selectively provide different solvents to match different directed self-assembly materials, enabling high precision pattern formation while maintaining operational flexibility rather than requiring fixed complex infrastructure
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables accurate formation of fine patterns on substrates by effectively causing microphase separation of various directed self-assembly materials, enhancing pattern precision and consistency.
Implementation Method 1
a thermal processing unit configured to perform thermal processing while supplying a solvent to the processing film formed on the substrate by the processing film formation unit
Implementation Method 2
the solvent is supplied during the thermal processing for the processing film such that the processing film can be swollen and the microphase separation of the directed self assembly material can be promoted
Data Source
AI summary
An underlayer is formed to cover the upper surface of a substrate and a guide pattern is formed on the underlayer. A DSA film constituted by two types of polymers is formed in a region on the underlayer where the guide pattern is not formed. Thermal processing is performed while a solvent is supplied to the DSA film on the substrate. Thus, a microphase separation of the DSA film occurs. As a result, patterns made of the one polymer and patterns made of another polymer are formed. Exposure processing and development processing are performed in this order on the DSA film after the microphase separation such that the patterns made of another polymer are removed.